| 6444277 |
Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates |
Kam S. Law, Robert Robertson, Pamela Lou, Angela Lee, Dan Maydan |
2002-09-03 |
| 6338874 |
Method for multilayer CVD processing in a single chamber |
Kam S. Law, Robert Robertson, Pamela Lou, Angela Lee, Dan Maydan |
2002-01-15 |
| 6225601 |
Heating a substrate support in a substrate handling chamber |
Emanuel Beer, Duoyan Shen, Eitan Zohar |
2001-05-01 |
| 5399387 |
Plasma CVD of silicon nitride thin films on large area glass substrates at high deposition rates |
Kam S. Law, Robert Robertson, Pamela Lou, Angela Lee, Dan Maydan |
1995-03-21 |
| 5380566 |
Method of limiting sticking of body to susceptor in a deposition treatment |
Robert Robertson, Angela Lee, Kam S. Law, Dan Maydan |
1995-01-10 |
