Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500321 | Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target | Kaihan Ashtiani, Richard S. Hill, Karl B. Levy, Robert Martinson | 2002-12-31 |
| 6497796 | Apparatus and method for controlling plasma uniformity across a substrate | Kaihan Ashtiani, Karl B. Levy, Kwok Fai Lai, Andrew L. Nordquist | 2002-12-24 |
| 6444105 | Physical vapor deposition reactor including magnet to control flow of ions | Kwok Fai Lai, Andrew L. Nordquist, Kaihan Ashtiani, Karl B. Levy | 2002-09-03 |
| 6193854 | Apparatus and method for controlling erosion profile in hollow cathode magnetron sputter source | Kwok Fai Lai, Andrew L. Nordquist, Kaihan Ashtiani, Karl B. Levy, Maximilian A. Biberger | 2001-02-27 |
| 6179973 | Apparatus and method for controlling plasma uniformity across a substrate | Kwok Fai Lai, Andrew L. Nordquist, Kaihan Ashtiani, Karl B. Levy | 2001-01-30 |
| 5985115 | Internally cooled target assembly for magnetron sputtering | David J. Harra, Ronald R. Cochran, Mingwei Jiang | 1999-11-16 |
| 5503676 | Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber | Paul Shufflebotham, Dean R. Denison | 1996-04-02 |
| 5417833 | Sputtering apparatus having a rotating magnet array and fixed electromagnets | David J. Harra | 1995-05-23 |
| 4420385 | Apparatus and process for sputter deposition of reacted thin films | — | 1983-12-13 |
| 4260649 | Laser induced dissociative chemical gas phase processing of workpieces | Dean R. Dension | 1981-04-07 |
| 4204936 | Method and apparatus for attaching a target to the cathode of a sputtering system | — | 1980-05-27 |