Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7717749 | Multiport RJ connector | John Chen, Kuok Leong, Man Yip, Wai Shun Leung, Chun Wing (Alan) Ng +1 more | 2010-05-18 |
| 7585399 | Rotating magnet arrays for magnetron sputtering apparatus | Kang Song, Douglas B. Hayden | 2009-09-08 |
| 6905959 | Apparatus and method for depositing superior Ta (N) copper thin films for barrier and seed applications in semiconductor processing | Kaihan Ashtiani, Maximilian A. Biberger, Erich R. Klawuhn, Karl B. Levy, J. Patrick Rymer | 2005-06-14 |
| 6683425 | Null-field magnetron apparatus with essentially flat target | — | 2004-01-27 |
| 6541371 | Apparatus and method for depositing superior Ta(N)/copper thin films for barrier and seed applications in semiconductor processing | Kaihan Ashtiani, Maximilian A. Biberger, Erich R. Klawuhn, Karl B. Levy, J. Patrick Rymer | 2003-04-01 |
| 6497796 | Apparatus and method for controlling plasma uniformity across a substrate | Kaihan Ashtiani, Karl B. Levy, Andrew L. Nordquist, Larry D. Hartsough | 2002-12-24 |
| 6444105 | Physical vapor deposition reactor including magnet to control flow of ions | Andrew L. Nordquist, Kaihan Ashtiani, Larry D. Hartsough, Karl B. Levy | 2002-09-03 |
| 6342133 | PVD deposition of titanium and titanium nitride layers in the same chamber without use of a collimator or a shutter | Gerard C. D'Couto, George Tkach, Jeff Dewayne Lyons, Max Biberger, Jean Lu +1 more | 2002-01-29 |
| 6193854 | Apparatus and method for controlling erosion profile in hollow cathode magnetron sputter source | Larry D. Hartsough, Andrew L. Nordquist, Kaihan Ashtiani, Karl B. Levy, Maximilian A. Biberger | 2001-02-27 |
| 6179973 | Apparatus and method for controlling plasma uniformity across a substrate | Andrew L. Nordquist, Kaihan Ashtiani, Larry D. Hartsough, Karl B. Levy | 2001-01-30 |
| 6149050 | Method for attaching solderable wire leads to a lead frame | Siu-wai Wan, Siu-keung Tse, Jack Xiong Zhenpeng | 2000-11-21 |
| 5593551 | Magnetron sputtering source for low pressure operation | — | 1997-01-14 |
| 5482611 | Physical vapor deposition employing ion extraction from a plasma | John C. Helmer, Robert L. Anderson | 1996-01-09 |