Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7722778 | Methods and apparatus for sensing unconfinement in a plasma processing chamber | Andreas Fischer | 2010-05-25 |
| 7534363 | Method for providing uniform removal of organic material | Rao Annapragada, Odette Turmel, Kenji Takeshita, Lily Zheng, Thomas S. Choi | 2009-05-19 |
| 7334477 | Apparatus and methods for the detection of an arc in a plasma processing system | — | 2008-02-26 |
| 6962879 | Method of plasma etching silicon nitride | Helen Zhu, S. M. Reza Sadjadi, Andrew S. Li | 2005-11-08 |
| 6909195 | Trench etch process for low-k dielectrics | Siyi Li, S. M. Reza Sadjadi, Steve Lassig, Sean S. Kang, Vinay Pohray +1 more | 2005-06-21 |
| 6794293 | Trench etch process for low-k dielectrics | Siyi Li, S. M. Reza Sadjadi, Steve Lassig, Sean S. Kang, Vinay Pohray +1 more | 2004-09-21 |
| 6670278 | Method of plasma etching of silicon carbide | Si Yi Li, Helen Zhu, S. M. Reza Sadjadi, James R. Bowers, Michael Goss | 2003-12-30 |
| 6016766 | Microwave plasma processor | John Daugherty, Michael Giarratano, C. Robert Koemtzopoulos, Felix Kozakevich | 2000-01-25 |
| 5915190 | Methods for filling trenches in a semiconductor wafer | — | 1999-06-22 |
| 5846373 | Method for monitoring process endpoints in a plasma chamber and a process monitoring arrangement in a plasma chamber | Randall S. Mundt, William Harshbarger | 1998-12-08 |
| 5841623 | Chuck for substrate processing and method for depositing a film in a radio frequency biased plasma chemical depositing system | Dean R. Denison, Alain Harrus | 1998-11-24 |
| 5647953 | Plasma cleaning method for removing residues in a plasma process chamber | Larry Williams, William Harshbarger, Timothy M. Ebel | 1997-07-15 |
| 5234526 | Window for microwave plasma processing device | Ching-Hwa Chen, Takashi Inoue, Shunji Miyahara, Masahiko Tanaka | 1993-08-10 |