Issued Patents All Time
Showing 25 most recent of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12354973 | Stress and overlay management for semiconductor processing | Pradeep Subrahmanyan, Sony Varghese | 2025-07-08 |
| 12278110 | Bias voltage modulation approach for SiO/SiN layer alternating etch process | Olivier Luere, Kenji Takeshita, Sanghyuk CHOI, Mengnan ZOU, Zihao Ding | 2025-04-15 |
| 12198951 | High pressure wafer processing systems and related methods | Qiwei Liang, Srinivas D. Nemani, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik +1 more | 2025-01-14 |
| 11756803 | Gas delivery system for high pressure processing chamber | Qiwei Liang, Srinivas D. Nemani, Adib Khan, Ellie Yieh | 2023-09-12 |
| 11705337 | Tungsten defluorination by high pressure treatment | Keith Tatseun Wong, Thomas Jongwan Kwon, Ellie Yieh | 2023-07-18 |
| 11527421 | Gas delivery system for high pressure processing chamber | Qiwei Liang, Srinivas D. Nemani, Adib Khan, Ellie Yieh | 2022-12-13 |
| 11495470 | Method of enhancing etching selectivity using a pulsed plasma | Hailong Zhou, Kenji Takeshita, Rajinder Dhindsa, Taehwan Lee, Iljo Kwak | 2022-11-08 |
| 11373877 | Methods and apparatus for in-situ protection liners for high aspect ratio reactive ion etching | Daisuke Shimizu, Taiki Hatakeyama, Shinichi Koseki, Jairaj Payyapilly, Hikaru Watanabe | 2022-06-28 |
| 11164723 | Methods and apparatus for etching semiconductor structures | Daisuke Shimizu, Taiki Hatakeyama, Katsumasa Kawasaki, Chunlei Zhang | 2021-11-02 |
| 10930471 | Methods and apparatus for etching semiconductor structures | Daisuke Shimizu, Taiki Hatakeyama, Katsumasa Kawasaki, Chunlei Zhang | 2021-02-23 |
| 10847360 | High pressure treatment of silicon nitride film | Keith Tatseun Wong, Srinivas D. Nemani, Ellie Yieh | 2020-11-24 |
| 10720341 | Gas delivery system for high pressure processing chamber | Qiwei Liang, Srinivas D. Nemani, Adib Khan, Ellie Yieh | 2020-07-21 |
| 10636704 | Seam-healing method upon supra-atmospheric process in diffusion promoting ambient | Bencherki Mebarki, Keith Tatseun Wong, He Ren, Mehul Naik, Ellie Yieh +1 more | 2020-04-28 |
| 10622214 | Tungsten defluorination by high pressure treatment | Keith Tatseun Wong, Thomas Jongwan Kwon, Ellie Yieh | 2020-04-14 |
| 10593518 | Methods and apparatus for etching semiconductor structures | Daisuke Shimizu, Taiki Hatakeyama, Katsumasa Kawasaki, Chunlei Zhang | 2020-03-17 |
| 10529603 | High pressure wafer processing systems and related methods | Qiwei Liang, Srinivas D. Nemani, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik +1 more | 2020-01-07 |
| 10424487 | Atomic layer etching processes | Jungmin Ko, Tom Choi, Junghoon Kim, Mang-Mang Ling | 2019-09-24 |
| 10269571 | Methods for fabricating nanowire for semiconductor applications | Keith Tatseun Wong, Shiyu Sun, Nam Sung Kim, Srinivas D. Nemani, Ellie Yieh | 2019-04-23 |
| 10242908 | Airgap formation with damage-free copper | Jungmin Ko, Oliver Luere | 2019-03-26 |
| 10224224 | High pressure wafer processing systems and related methods | Qiwei Liang, Srinivas D. Nemani, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik +1 more | 2019-03-05 |
| 10177050 | Methods and apparatus for controlling substrate uniformity | S. M. Reza Sadjadi, Dmitry Lubomirsky, Hamid Noorbakhsh, John Zheng Ye, David H. Quach | 2019-01-08 |
| 10062575 | Poly directional etch by oxidation | Tom Choi, Jungmin Ko | 2018-08-28 |
| 10049927 | Seam-healing method upon supra-atmospheric process in diffusion promoting ambient | Bencherki Mebarki, Keith Tatseun Wong, He Ren, Mehul Naik, Ellie Yieh +1 more | 2018-08-14 |
| 9721807 | Cyclic spacer etching process with improved profile control | Qingjun Zhou, Jungmin Ko, Tom Choi, Jeremiah T. Pender, Srinivas D. Nemani +1 more | 2017-08-01 |
| 9543163 | Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process | Mang-Mang Ling, Jungmin Ko, Jeremiah T. Pender, Srinivas D. Nemani, Bradley J. Howard | 2017-01-10 |