Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12235624 | Methods and mechanisms for adjusting process chamber parameters during substrate manufacturing | Chunlei Zhang, Tao Zhang | 2025-02-25 |
| 11373877 | Methods and apparatus for in-situ protection liners for high aspect ratio reactive ion etching | Daisuke Shimizu, Taiki Hatakeyama, Shinichi Koseki, Sean S. Kang, Hikaru Watanabe | 2022-06-28 |
| 9748366 | Etching oxide-nitride stacks using C4F6H2 | Jong Mun Kim, Kenny L. Doan, Li Ling, Srinivas D. Nemani, Daisuke Shimizu +1 more | 2017-08-29 |
| 9305804 | Plasma etch processes for opening mask layers | Jong Mun Kim | 2016-04-05 |
| 8778207 | Plasma etch processes for boron-doped carbonaceous mask layers | Jong Mun Kim, Kenny L. Doan | 2014-07-15 |