QZ

Qingjun Zhou

Applied Materials: 17 patents #785 of 7,310Top 15%
MI Micromaterials: 3 patents #15 of 34Top 45%
BC Beijing Naura Microelectronics Equipment Co.: 1 patents #72 of 168Top 45%
Overall (All Time): #135,050 of 4,157,543Top 4%
28
Patents All Time

Issued Patents All Time

Showing 25 most recent of 28 patents

Patent #TitleCo-InventorsDate
12400054 Method for building finite element model of corneal endothelial cells Lixin Xie, Dongfang Li, Zongyi Li, Ping Lin, Xinhang Wang +1 more 2025-08-26
12324769 Double-network versatile hydrogel with antibacterial and drug sequential release capabilities Hengrui Zhang, Shuqin Meng, Huifang Ren 2025-06-10
12319947 Method for preparing (S)-nicotine by reduction Wenqing Lin, Hongjie Zheng, Xiaobo Liu, Zecong Chen, Lingyu Li +5 more 2025-06-03
12106970 Pattern sheet, semiconductor intermediate product, and hole etching method Qiushi Xie, Xiaoping Shi, Dongsan Li, Chun Wang, Yiming Zhang 2024-10-01
12090156 Application of CB-839 in preparation of drug for inhibiting corneal neovascularization (CNV) Weiyun Shi, Hongwei Wang, Bining Zhang 2024-09-17
12076443 Preparation method of nanozyme composite-based hybrid hydrogel eye drop Weiyun Shi, Hongwei Wang, Fangying Song 2024-09-03
11761003 Adeno-associated virus for activating RNA-NEAT1 over-expression and applications thereof Weiyun Shi, Qun Wang, Shengqian Dou, Hui Jiang, Bin Zhang 2023-09-19
11508618 Multicolor self-aligned contact selective etch Yung-Chen Lin, Ying Zhang, Ho-yung David Hwang 2022-11-22
11302519 Method of patterning a low-k dielectric film Srinivas D. Nemani, Jeremiah T. Pender, Dmitry Lubomirsky, Sergey G. Belostotskiy 2022-04-12
11094589 Multicolor self-aligned contact selective etch Yung-Chen Lin, Ying Zhang, Ho-yung David Hwang 2021-08-17
10840138 Selectively etched self-aligned via processes Yung-Chen Lin, Ying Zhang, Ho-yung David Hwang 2020-11-17
10770568 Method to remove III-V materials in high aspect ratio structures Xinyu BAO, Ying Zhang, YungChen Lin 2020-09-08
10741393 Methods for bottom up fin structure formation Yung-Chen Lin, Xinyu BAO, Ying Zhang 2020-08-11
10692728 Use of selective aluminum oxide etch Ying Zhang, Yung-Chen Lin 2020-06-23
10593594 Selectively etched self-aligned via processes Yung-Chen Lin, Ying Zhang, Ho-yung David Hwang, Uday Mitra, Regina Freed 2020-03-17
10510602 Methods of producing self-aligned vias Ying Zhang, Abhijit Basu Mallick, Yung-Chen Lin, He Ren, Ho-yung David Hwang +1 more 2019-12-17
10510540 Mask scheme for cut pattern flow with enlarged EPE window Ying Zhang, Yung-Chen Lin, Ho-yung David Hwang 2019-12-17
10439047 Methods for etch mask and fin structure formation Yung-Chen Lin, Ying Zhang 2019-10-08
10204781 Methods for bottom up fin structure formation Yung-Chen Lin, Xinyu BAO, Ying Zhang 2019-02-12
9818621 Cyclic oxide spacer etch process Aurelien Tavernier, Tom Choi, YungChen Lin, Ying Zhang, Olivier Joubert 2017-11-14
9721807 Cyclic spacer etching process with improved profile control Jungmin Ko, Tom Choi, Sean S. Kang, Jeremiah T. Pender, Srinivas D. Nemani +1 more 2017-08-01
9478433 Cyclic spacer etching process with improved profile control Jungmin Ko, Tom Choi, Sean S. Kang, Jeremiah T. Pender, Srinivas D. Nemani +1 more 2016-10-25
9368370 Temperature ramping using gas distribution plate heat Sergey G. Belostotskiy, Chinh Dinh, Srinivas D. Nemani, Andrew Nguyen 2016-06-14
9165783 Method of patterning a low-k dielectric film Srinivas D. Nemani, Jeremiah T. Pender, Dmitry Lubomirsky, Sergey G. Belostotskiy 2015-10-20
9093389 Method of patterning a silicon nitride dielectric film Srinivas D. Nemani, Jeremiah T. Pender, Dmitry Lubomirsky, Sergey G. Belostotskiy 2015-07-28