SB

Sergey G. Belostotskiy

Applied Materials: 13 patents #1,030 of 7,310Top 15%
📍 Bellevue, WA: #907 of 6,950 inventorsTop 15%
🗺 Washington: #7,816 of 76,902 inventorsTop 15%
Overall (All Time): #374,353 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
11410860 Process chamber for etching low k and other dielectric films Dmitry Lubomirsky, Srinivas D. Nemani, Ellie Yieh 2022-08-09
11302519 Method of patterning a low-k dielectric film Srinivas D. Nemani, Jeremiah T. Pender, Qingjun Zhou, Dmitry Lubomirsky 2022-04-12
10923367 Process chamber for etching low K and other dielectric films Dmitry Lubomirsky, Srinivas D. Nemani, Ellie Yieh 2021-02-16
10096496 Process chamber for etching low K and other dielectric films Dmitry Lubomirsky, Srinivas D. Nemani, Ellie Yieh 2018-10-09
9666414 Process chamber for etching low k and other dielectric films Dmitry Lubomirsky, Srinivas D. Nemani, Ellie Yieh 2017-05-30
9601301 Non-intrusive measurement of a wafer DC self-bias in semiconductor processing equipment Chinh Dinh, Andrew Nguyen, Michael G. Chafin 2017-03-21
9368370 Temperature ramping using gas distribution plate heat Chinh Dinh, Qingjun Zhou, Srinivas D. Nemani, Andrew Nguyen 2016-06-14
9165783 Method of patterning a low-k dielectric film Srinivas D. Nemani, Jeremiah T. Pender, Qingjun Zhou, Dmitry Lubomirsky 2015-10-20
9093389 Method of patterning a silicon nitride dielectric film Srinivas D. Nemani, Jeremiah T. Pender, Qingjun Zhou, Dmitry Lubomirsky 2015-07-28
8932959 Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material Srinivas D. Nemani, Mang-Mang Ling, Jeremiah T. Pender, Kartik Ramaswamy, Andrew Nguyen +1 more 2015-01-13
8802572 Method of patterning a low-k dielectric film Srinivas D. Nemani, Jeremiah T. Pender, Qingjun Zhou, Dmitry Lubomirsky 2014-08-12
8748322 Silicon oxide recess etch Nancy Fung, David T. Or, Qingjun Zhou, Lina Zhu, Jeremiah T. Pender +3 more 2014-06-10
8580693 Temperature enhanced electrostatic chucking in plasma processing apparatus Michael G. Chafin, Jingbao Liu, David Palagashvili 2013-11-12