Issued Patents All Time
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9520302 | Methods for controlling Fin recess loading | Jungmin Ko, Kwang Soo Kim, Olivier Luere | 2016-12-13 |
| 9514953 | Methods for barrier layer removal | Chia-Ling Kao, Jeremiah T. Pender, Srinivas D. Nemani, He Ren, Mehul Naik | 2016-12-06 |
| 9478433 | Cyclic spacer etching process with improved profile control | Qingjun Zhou, Jungmin Ko, Tom Choi, Jeremiah T. Pender, Srinivas D. Nemani +1 more | 2016-10-25 |
| 9412579 | Methods and apparatus for controlling substrate uniformity | S. M. Reza Sadjadi, Dmitry Lubomirsky, Hamid Noorbakhsh, John Zheng Ye, David H. Quach | 2016-08-09 |
| 9368369 | Methods for forming a self-aligned contact via selective lateral etch | Jungmin Ko | 2016-06-14 |
| 9299577 | Methods for etching a dielectric barrier layer in a dual damascene structure | He Ren, Chia-Ling Kao, Jeremiah T. Pender, Srinivas D. Nemani, Mehul Naik | 2016-03-29 |
| 9269590 | Spacer formation | Olivier Luere, Srinivas D. Nemani | 2016-02-23 |
| 9006106 | Method of removing a metal hardmask | Chia-Ling Kao, Kwang Soo Kim, Srinivas D. Nemani | 2015-04-14 |
| 8992792 | Method of fabricating an ultra low-k dielectric self-aligned via | Chih-Yang Chang, Chia-Ling Kao, Nikolaos Bekiaris | 2015-03-31 |
| 8987139 | Method of patterning a low-k dielectric film | Chia-Ling Kao, Srinivas D. Nemani | 2015-03-24 |
| 8980758 | Methods for etching an etching stop layer utilizing a cyclical etching process | Mang-Mang Ling, Jeremiah T. Pender, Srinivas D. Nemani, Bradley J. Howard | 2015-03-17 |
| 8912633 | In-situ photoresist strip during plasma etching of active hard mask | Sangjun Cho, Tom Choi, Taejoon Han, Prabhakara Gopaladasu, Bi-Ming Yen | 2014-12-16 |
| 8895449 | Delicate dry clean | Lina Zhu, Srinivas D. Nemani, Chia-Ling Kao | 2014-11-25 |
| 8815745 | Reducing damage to low-K materials during photoresist stripping | Sang-Jun Cho, Thomas S. Choi | 2014-08-26 |
| 8748322 | Silicon oxide recess etch | Nancy Fung, David T. Or, Qingjun Zhou, Lina Zhu, Jeremiah T. Pender +3 more | 2014-06-10 |
| 8283255 | In-situ photoresist strip during plasma etching of active hard mask | Sangjun Cho, Tom Choi, Taejoon Han, Prabhakara Gopaladasu, Bi-Ming Yen | 2012-10-09 |
| 8124516 | Trilayer resist organic layer etch | Sang-Jun Cho, Tom Choi, Taejoon Han | 2012-02-28 |
| 7892445 | Wafer electrical discharge control using argon free dechucking gas | David Wei, Howard Dang, Masahiro Watanabe, Kenji Takeshita, Mayumi Block +2 more | 2011-02-22 |
| 7789991 | Lag control | Binet Worsham, David Wei, Vinay Pohray, Bi-Ming Yen | 2010-09-07 |
| 7782591 | Methods of and apparatus for reducing amounts of particles on a wafer during wafer de-chucking | Sangjun Cho, Tom Choi, Taejoon Han | 2010-08-24 |
| 7541291 | Reduction of feature critical dimensions | Sangheon Lee, Wan-Lin Chen, Eric A. Hudson, S. M. Reza Sadjadi, Gan Ming Zhao | 2009-06-02 |
| 7307025 | Lag control | Binet Worsham, David Wei, Vinay Pohray, Bi-Ming Yen | 2007-12-11 |
| 7250371 | Reduction of feature critical dimensions | Sangheon Lee, Wan-Lin Chen, Eric A. Hudson, S. M. Reza Sadjadi, Gan Ming Zhao | 2007-07-31 |
| 7192531 | In-situ plug fill | Sangheon Lee, Wan-Lin Chen, Eric A. Hudson, Reza Sadjadi | 2007-03-20 |
| 7084070 | Treatment for corrosion in substrate processing | Sangheon Lee, S M Reza Sadjadi, Subhash Deshmukh, Ji Soo Kim | 2006-08-01 |