Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347692 | Wet bench process with in-situ pre-treatment operation | Chung-Wei Chang, Bo-Wei Chou, Chin-Ming Lin, Ping-Jung Huang, Pi-Chun Yu +1 more | 2025-07-01 |
| 12165887 | Wafer cleaning apparatus and method | Jieh-Chau HUANG, Ying Ting Hsia, Ping-Jung Huang, Pei Yen Hsia, Hung-Lung Hu | 2024-12-10 |
| 11764081 | Wafer cleaning apparatus and method | Jieh-Chau HUANG, Hung-Lung Hu, Ying Ting Hsia, Ping-Jung Huang, Pei Yen Hsia | 2023-09-19 |
| 11495684 | Method of removing an etch mask | Chun-Han Chu, Nai-Chia Chen, Ping-Jung Huang, Tsung-Min Chuo, Jui-Ming Shih | 2022-11-08 |
| 11056358 | Wafer cleaning apparatus and method | Jieh-Chau HUANG, Hung-Lung Hu, Ying Ting Hsia, Ping-Jung Huang, Pei Yen Hsia | 2021-07-06 |
| 10636908 | Method of removing an etch mask | Chun-Han Chu, Nai-Chia Chen, Ping-Jung Huang, Tsung-Min Chuo, Jui-Ming Shih | 2020-04-28 |
| 10553720 | Method of removing an etch mask | Chun-Han Chu, Nai-Chia Chen, Jui-Ming Shih, Ping-Jung Huang, Tsung-Min Chuo | 2020-02-04 |
| 9733570 | Multi-line width pattern created using photolithography | Chun-Liang Tai, Chun-Hung Lee, De-Fang Chen | 2017-08-15 |
| 9601333 | Etching process | Ming-Hsi Yeh, Yih-Ann Lin, Chao-Cheng Chen, Syun-Ming Jang | 2017-03-21 |
| 9589798 | Method of making a semiconductor device using a barrier and antireflective coating (BARC) layer | Tsai-Chun Li | 2017-03-07 |
| 9455156 | Method of making a semiconductor device using multiple layer sets | Tsai-Chun Li, Chun-Ming Hu | 2016-09-27 |
| 9176388 | Multi-line width pattern created using photolithography | Chun-Liang Tai, Chun-Hung Lee, De-Fang Chen | 2015-11-03 |
| 9159580 | Method of making a semiconductor device using multiple layer sets | Tsai-Chun Li, Chun-Ming Hu | 2015-10-13 |
| 9159581 | Method of making a semiconductor device using a bottom antireflective coating (BARC) layer | Tsai-Chun Li | 2015-10-13 |
| 8912633 | In-situ photoresist strip during plasma etching of active hard mask | Sangjun Cho, Tom Choi, Taejoon Han, Sean S. Kang, Prabhakara Gopaladasu | 2014-12-16 |
| 8801892 | Uniform etch system | Dean J. Larson, Babak Kadkhodayan, Di Wu, Kenji Takeshita, Xingcai Su +2 more | 2014-08-12 |
| 8652298 | Triode reactor design with multiple radiofrequency powers | Rajinder Dhindsa, Alexei Marakhtanov, Gerardo Delgadino, Eric A. Hudson, Andrew D. Bailey, III | 2014-02-18 |
| 8283255 | In-situ photoresist strip during plasma etching of active hard mask | Sangjun Cho, Tom Choi, Taejoon Han, Sean S. Kang, Prabhakara Gopaladasu | 2012-10-09 |
| 8236188 | Method for low-K dielectric etch with reduced damage | Bing Ji, Kenji Takeshita, Andrew D. Bailey, III, Eric A. Hudson, Maryam Moravej +6 more | 2012-08-07 |
| 7951616 | Process for wafer temperature verification in etch tools | Keren Jacobs Kanarik, C. Robert Koemtzopoulos, James Rogers | 2011-05-31 |
| 7789991 | Lag control | Binet Worsham, Sean S. Kang, David Wei, Vinay Pohray | 2010-09-07 |
| 7442114 | Methods for silicon electrode assembly etch rate and etch uniformity recovery | Tuochuan Huang, Daxing Ren, Hong Shih, Catherine Zhou, Chun Yan +4 more | 2008-10-28 |
| 7371332 | Uniform etch system | Dean J. Larson, Babak Kadkhodayan, Di Wu, Kenji Takeshita, Xingcai Su +2 more | 2008-05-13 |
| 7307025 | Lag control | Binet Worsham, Sean S. Kang, David Wei, Vinay Pohray | 2007-12-11 |
| 7211518 | Waferless automatic cleaning after barrier removal | Xiaoqiang Yao, Taejoon Han, Peter Loewenhardt | 2007-05-01 |