Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12305279 | Ultra high-k hafnium oxide and hafnium zirconium oxide films | Harshil Kashyap, Andrew C. Kummel, Ajay Kumar Yadav, Srinivas D. Nemani, Ellie Yieh | 2025-05-20 |
| 12261037 | Tunability of dopant concentration in thin hafnium oxide films | Golnaz Karbasian | 2025-03-25 |
| 12211736 | Flowable chemical vapor deposition of metal oxides | Hurshvardhan Srivastava | 2025-01-28 |
| 12198951 | High pressure wafer processing systems and related methods | Qiwei Liang, Srinivas D. Nemani, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik +1 more | 2025-01-14 |
| 12142467 | Self-assembled monolayer deposition from low vapor pressure organic molecules | Qiwei Liang, Srinivas D. Nemani, Antony K. Jan | 2024-11-12 |
| 11993845 | High selectivity atomic layer deposition process | Jong Hun Choi, Christopher Ahles, Andrew C. Kummel, Srinivas D. Nemani | 2024-05-28 |
| 11993842 | Selective deposition of metal oxide by pulsed chemical vapor deposition | Srinivas D. Nemani, Andrew C. Kummel, James P. Huang, Yunil Cho | 2024-05-28 |
| 11821079 | Methods for depositing molybdenum sulfide | Hyojin Kim | 2023-11-21 |
| 11756828 | Cluster processing system for forming a transition metal material | Srinivas D. Nemani, Ellie Yieh | 2023-09-12 |
| 11705337 | Tungsten defluorination by high pressure treatment | Thomas Jongwan Kwon, Sean S. Kang, Ellie Yieh | 2023-07-18 |
| 11664215 | High selectivity atomic later deposition process | Christopher Ahles, Jong Hun Choi, Andrew C. Kummel, Srinivas D. Nemani | 2023-05-30 |
| 11626284 | Method of forming a 2-dimensional channel material, using ion implantation | Hurshvardhan Srivastava, Srinivas D. Nemani, Johannes M. van Meer, Rajesh Prasad | 2023-04-11 |
| 11542597 | Selective deposition of metal oxide by pulsed chemical vapor deposition | Srinivas D. Nemani, Andrew C. Kummel, James P. Huang, Yunil Cho | 2023-01-03 |
| 10957590 | Method for forming a layer | Wenhui Wang, Huixiong Dai, Christopher S. Ngai, Liqi Wu, Wenyu Zhang +3 more | 2021-03-23 |
| 10916426 | Formation of crystalline, layered transition metal dichalcogenides | Srinivas D. Nemani, Ellie Yieh | 2021-02-09 |
| 10847360 | High pressure treatment of silicon nitride film | Sean S. Kang, Srinivas D. Nemani, Ellie Yieh | 2020-11-24 |
| 10818510 | Self-assembled monolayer blocking with intermittent air-water exposure | Tobin Kaufman-Osborn | 2020-10-27 |
| 10790183 | Selective oxidation for 3D device isolation | Shiyu Sun, Kurtis Leschkies, Namsung Kim, Srinivas D. Nemani | 2020-09-29 |
| 10636704 | Seam-healing method upon supra-atmospheric process in diffusion promoting ambient | Bencherki Mebarki, Sean S. Kang, He Ren, Mehul Naik, Ellie Yieh +1 more | 2020-04-28 |
| 10622214 | Tungsten defluorination by high pressure treatment | Thomas Jongwan Kwon, Sean S. Kang, Ellie Yieh | 2020-04-14 |
| 10529603 | High pressure wafer processing systems and related methods | Qiwei Liang, Srinivas D. Nemani, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik +1 more | 2020-01-07 |
| 10269571 | Methods for fabricating nanowire for semiconductor applications | Shiyu Sun, Sean S. Kang, Nam Sung Kim, Srinivas D. Nemani, Ellie Yieh | 2019-04-23 |
| 10224224 | High pressure wafer processing systems and related methods | Qiwei Liang, Srinivas D. Nemani, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik +1 more | 2019-03-05 |
| 10192752 | Self-assembled monolayer blocking with intermittent air-water exposure | Tobin Kaufman-Osborn | 2019-01-29 |
| 10179941 | Gas delivery system for high pressure processing chamber | Adib Khan, Qiwei Liang, Sultan Malik, Srinivas D. Nemani | 2019-01-15 |