| 12334354 |
Sidewall passivation for plasma etching |
Zhonghua Yao, Qian Fu, Mukund Srinivasan |
2025-06-17 |
| 12237149 |
Reducing aspect ratio dependent etch with direct current bias pulsing |
Deyang Li, Sunil Srinivasan, Yi-Chuan Chou, Shahid Rauf, Kuan-Ting Liu +5 more |
2025-02-25 |
| 10763142 |
System and method for determining field non-uniformities of a wafer processing chamber using a wafer processing parameter |
Marcus Musselman, Juan Valdivia, Hua Xiang, Andrew D. Bailey, III, Yoko Yamaguchi +1 more |
2020-09-01 |
| 10446394 |
Spacer profile control using atomic layer deposition in a multiple patterning process |
Mirzafer Abatchev, Qian Fu, Yoko Yamaguchi |
2019-10-15 |
| 10242883 |
High aspect ratio etch of oxide metal oxide metal stack |
Joydeep Guha, Sirish Reddy, Kaushik Chattopadhyay, Thomas W. Mountsier, Thorsten Lill +2 more |
2019-03-26 |
| 9899227 |
System, method and apparatus for ion milling in a plasma etch chamber |
Joydeep Guha, Butsurin Jinnai, Jun Hee HAN |
2018-02-20 |
| 9659783 |
High aspect ratio etch with combination mask |
Joydeep Guha, Sirish Reddy, Kaushik Chattopadhyay, Thomas W. Mountsier, Thorsten Lill +2 more |
2017-05-23 |
| 9018103 |
High aspect ratio etch with combination mask |
Joydeep Guha, Sirish Reddy, Kaushik Chattopadhyay, Thomas W. Mountsier, Thorsten Lill +2 more |
2015-04-28 |
| 7682480 |
Photoresist conditioning with hydrogen ramping |
Keren Jacobs Kanarik |
2010-03-23 |
| 7645707 |
Etch profile control |
Camelia Rusu, Zhisong Huang, Mukund Srinivasan, Eric A. Hudson |
2010-01-12 |
| 7547635 |
Process for etching dielectric films with improved resist and/or etch profile characteristics |
Mukund Srinivasan, Robert Chebi |
2009-06-16 |
| 7544521 |
Negative bias critical dimension trim |
Scott Briggs |
2009-06-09 |
| 7405521 |
Multiple frequency plasma processor method and apparatus |
Raj Dhindsa, S. M. Reza Sadjadi, Felix Kozakevich, Dave Trussell, Lumin Li +5 more |
2008-07-29 |
| 7135410 |
Etch with ramping |
Keren Jacobs |
2006-11-14 |
| 7053003 |
Photoresist conditioning with hydrogen ramping |
Karen Jacobs Kanarik |
2006-05-30 |
| 6921724 |
Variable temperature processes for tunable electrostatic chuck |
Tom A. Kamp, Richard A. Gottscho, Steve Lee, Chris Lee, Yoko Yamaguchi +1 more |
2005-07-26 |
| 6824627 |
Stepped upper electrode for plasma processing uniformity |
Rajinder Dhindsa, Mukund Srinivasan, Eric H. Lenz |
2004-11-30 |
| 6391787 |
Stepped upper electrode for plasma processing uniformity |
Rajinder Dhindsa, Mukund Srinivasan, Eric H. Lenz |
2002-05-21 |
