| 9190302 |
System and method for controlling plasma with an adjustable coupling to ground circuit |
Tuqiang Ni |
2015-11-17 |
| 8518211 |
System and method for controlling plasma with an adjustable coupling to ground circuit |
Tuqiang Ni |
2013-08-27 |
| 8114246 |
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
Tuqiang Ni, David Hemker, Lumin Li |
2012-02-14 |
| 7105102 |
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
Tuqiang Ni, David Hemker, Lumin Li |
2006-09-12 |
| 7077971 |
Methods for detecting the endpoint of a photoresist stripping process |
Tuqiang Ni |
2006-07-18 |
| 6716303 |
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
Tuqiang Ni, David Hemker, Lumin Li |
2004-04-06 |
| 6692649 |
Inductively coupled plasma downstream strip module |
Michael Barnes, Tuqiang Ni, Butch Berney, Wayne Vereb, Brian McMillin |
2004-02-17 |
| 6514378 |
Method for improving uniformity and reducing etch rate variation of etching polysilicon |
Tuqiang Ni, Kenji Takeshita, Tom Choi, Frank Y. Lin |
2003-02-04 |
| 6451158 |
Apparatus for detecting the endpoint of a photoresist stripping process |
Tuqiang Ni |
2002-09-17 |
| 6388383 |
Method of an apparatus for obtaining neutral dissociated gas atoms |
Tuqiang Ni |
2002-05-14 |
| 6257168 |
Elevated stationary uniformity ring design |
Tuqiang Ni |
2001-07-10 |
| 6229264 |
Plasma processor with coil having variable rf coupling |
Tiqiang Ni, John Holland |
2001-05-08 |
| 6203657 |
Inductively coupled plasma downstream strip module |
Michael Barnes, Tuqiang Ni, Butch Berney, Wayne Vereb, Brian McMillin |
2001-03-20 |
| 6052176 |
Processing chamber with optical window cleaned using process gas |
Tuqiang Ni |
2000-04-18 |
