Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9190302 | System and method for controlling plasma with an adjustable coupling to ground circuit | Tuqiang Ni | 2015-11-17 |
| 8518211 | System and method for controlling plasma with an adjustable coupling to ground circuit | Tuqiang Ni | 2013-08-27 |
| 8114246 | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same | Tuqiang Ni, David Hemker, Lumin Li | 2012-02-14 |
| 7105102 | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same | Tuqiang Ni, David Hemker, Lumin Li | 2006-09-12 |
| 7077971 | Methods for detecting the endpoint of a photoresist stripping process | Tuqiang Ni | 2006-07-18 |
| 6716303 | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same | Tuqiang Ni, David Hemker, Lumin Li | 2004-04-06 |
| 6692649 | Inductively coupled plasma downstream strip module | Michael Barnes, Tuqiang Ni, Butch Berney, Wayne Vereb, Brian McMillin | 2004-02-17 |
| 6514378 | Method for improving uniformity and reducing etch rate variation of etching polysilicon | Tuqiang Ni, Kenji Takeshita, Tom Choi, Frank Y. Lin | 2003-02-04 |
| 6451158 | Apparatus for detecting the endpoint of a photoresist stripping process | Tuqiang Ni | 2002-09-17 |
| 6388383 | Method of an apparatus for obtaining neutral dissociated gas atoms | Tuqiang Ni | 2002-05-14 |
| 6257168 | Elevated stationary uniformity ring design | Tuqiang Ni | 2001-07-10 |
| 6229264 | Plasma processor with coil having variable rf coupling | Tiqiang Ni, John Holland | 2001-05-08 |
| 6203657 | Inductively coupled plasma downstream strip module | Michael Barnes, Tuqiang Ni, Butch Berney, Wayne Vereb, Brian McMillin | 2001-03-20 |
| 6052176 | Processing chamber with optical window cleaned using process gas | Tuqiang Ni | 2000-04-18 |