Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9188848 | Maskless vortex phase shift optical direct write lithography | Nicholas K. Eib, Neal Callan | 2015-11-17 |
| 8377633 | Maskless vortex phase shift optical direct write lithography | Nicholas K. Eib, Neal Callan | 2013-02-19 |
| 8057963 | Maskless vortex phase shift optical direct write lithography | Nicholas K. Eib, Neal Callan | 2011-11-15 |
| 7738078 | Optimized mirror design for optical direct write | Nicholas K. Eib, Neal Callan | 2010-06-15 |
| 7494752 | Method and systems for utilizing simplified resist process models to perform optical and process corrections | — | 2009-02-24 |
| 7458060 | Yield-limiting design-rules-compliant pattern library generation and layout inspection | Nicolas K. Eib | 2008-11-25 |
| 7372547 | Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography | Nicholas K. Eib, Neal Callan | 2008-05-13 |
| 7325222 | Method and apparatus for verifying the post-optical proximity corrected mask wafer image sensitivity to reticle manufacturing errors | Nadya Strelkova, John V. Jensen | 2008-01-29 |
| 7313508 | Process window compliant corrections of design layout | Colin D. Yates, Nicholas K. Eib, Christopher Neville, Mario Garza, Neal Callan | 2007-12-25 |
| 7270942 | Optimized mirror design for optical direct write | Nicholas K. Eib, Neal Callan | 2007-09-18 |
| 7264906 | OPC based illumination optimization with mask error constraints | Nicholas K. Eib, Mario Garza, Paul G. Filseth, Lav D. Ivanovic | 2007-09-04 |
| 7189498 | Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process | Nicholas K. Eib, Neal Callan | 2007-03-13 |
| 7117475 | Method and system for utilizing an isofocal contour to perform optical and process corrections | — | 2006-10-03 |
| 7001695 | Multiple alternating phase shift technology for amplifying resolution | Christopher Neville | 2006-02-21 |