Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7451721 | Utility location indicator apparatus | Amada V. Garza | 2008-11-18 |
| 7313508 | Process window compliant corrections of design layout | Ebo Croffie, Colin D. Yates, Nicholas K. Eib, Christopher Neville, Neal Callan | 2007-12-25 |
| 7264906 | OPC based illumination optimization with mask error constraints | Ebo Croffie, Nicholas K. Eib, Paul G. Filseth, Lav D. Ivanovic | 2007-09-04 |
| 7149340 | Mask defect analysis for both horizontal and vertical processing effects | Paul G. Filseth, Neal Callan, Kunal N. Taravade | 2006-12-12 |
| 7069535 | Optical proximity correction method using weighted priorities | Olga A. Kobozeva, Ramnath Venkatraman | 2006-06-27 |
| 6868355 | Automatic calibration of a masking process simulator | Lav D. Ivanovic, Paul G. Filseth | 2005-03-15 |
| 6782525 | Wafer process critical dimension, alignment, and registration analysis simulation tool | Neal Callan, George E. Bailey, Travis Brist, Paul G. Filseth | 2004-08-24 |
| 6768958 | Automatic calibration of a masking process simulator | Lav D. Ivanovic, Paul G. Filseth | 2004-07-27 |
| 6701511 | Optical and etch proximity correction | Paul G. Filseth | 2004-03-02 |
| 6611953 | Mask correction optimization | Paul G. Filseth | 2003-08-26 |
| 6532585 | Method and apparatus for application of proximity correction with relative segmentation | Dusan Petranovic, Ranko Scepanovic, Edwin Jones, Richard Schinella, Nicholas F. Pasch +3 more | 2003-03-11 |
| 6499003 | Method and apparatus for application of proximity correction with unitary segmentation | Edwin Jones, Dusan Petranovic, Ranko Scepanovic, Richard Schinella, Nicholas F. Pasch +3 more | 2002-12-24 |
| 6426131 | Off-axis pupil aperture and method for making the same | Philip Eric Jackson, Christopher Neville | 2002-07-30 |
| 6282696 | Performing optical proximity correction with the aid of design rule checkers | Nicholas K. Eib, John V. Jensen, Keith K. Chao | 2001-08-28 |
| 6269472 | Optical proximity correction method and apparatus | John V. Jensen, Nicholas K. Eib, Keith K. Chao | 2001-07-31 |
| 6175953 | Method and apparatus for general systematic application of proximity correction | Ranko Scepanovic, Dusan Petranovic, Edwin Jones, Richard Schinella, Nicholas F. Pasch +3 more | 2001-01-16 |
| 6174630 | Method of proximity correction with relative segmentation | Dusan Petranovic, Ranko Scepanovic, Edwin Jones, Richard Schinella, Nicholas F. Pasch +3 more | 2001-01-16 |
| 6081659 | Comparing aerial image to actual photoresist pattern for masking process characterization | Keith K. Chao | 2000-06-27 |
| 6078738 | Comparing aerial image to SEM of photoresist or substrate pattern for masking process characterization | Keith K. Chao | 2000-06-20 |
| 5972541 | Reticle and method of design to correct pattern for depth of focus problems | Emery Sugasawara | 1999-10-26 |
| 5900338 | Performing optical proximity correction with the aid of design rule checkers | Nicholas K. Eib, John V. Jensen, Keith K. Chao | 1999-05-04 |
| 5804340 | Photomask inspection method and inspection tape therefor | Keith K. Chao | 1998-09-08 |
| 5795682 | Guard rings to compensate for side lobe ringing in attenuated phase shift reticles | — | 1998-08-18 |
| 5723233 | Optical proximity correction method and apparatus | Nicholas K. Eib, Keith K. Chao | 1998-03-03 |
| 5705301 | Performing optical proximity correction with the aid of design rule checkers | Nicholas K. Eib, John V. Jensen, Keith K. Chao | 1998-01-06 |