| 8343373 |
Method of aligning nanotubes and wires with an etched feature |
— |
2013-01-01 |
| 7858979 |
Method of aligning deposited nanotubes onto an etched feature using a spacer |
Christopher Neville, Thomas Rueckes, Steven L. Konsek, Mitchell Meinhold, Claude L. Bertin |
2010-12-28 |
| 7575693 |
Method of aligning nanotubes and wires with an etched feature |
Thomas Rueckes, Steven L. Konsek, Mitchell Meinhold, Claude L. Bertin |
2009-08-18 |
| 7541216 |
Method of aligning deposited nanotubes onto an etched feature using a spacer |
Christopher Neville |
2009-06-02 |
| 7313508 |
Process window compliant corrections of design layout |
Ebo Croffie, Nicholas K. Eib, Christopher Neville, Mario Garza, Neal Callan |
2007-12-25 |
| 7016041 |
Reticle overlay correction |
James R. B. Elmer |
2006-03-21 |
| 6809824 |
Alignment process for integrated circuit structures on semiconductor substrate using scatterometry measurements of latent images in spaced apart test fields on substrate |
Nicholas F. Pasch, Nicholas K. Eib |
2004-10-26 |
| 6458508 |
Method of protecting acid-catalyzed photoresist from chip-generated basic contaminants |
Nicholas F. Pasch, Shumay X. Dou |
2002-10-01 |
| 6425117 |
System and method for performing optical proximity correction on the interface between optical proximity corrected cells |
Nicholas F. Pasch, Nicholas K. Eib, Shumay X. Dou |
2002-07-23 |
| 5863825 |
Alignment mark contrast enhancement |
Nicholas F. Pasch, Marilyn Hwan, Richard S. Osugi, Dawn M. Lee, Shumay X. Dou |
1999-01-26 |