| 12067340 |
Computational wafer inspection |
Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh +1 more |
2024-08-20 |
| 11080459 |
Computational wafer inspection |
Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh +1 more |
2021-08-03 |
| 10579772 |
Computational wafer inspection |
Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh +1 more |
2020-03-03 |
| 9990462 |
Computational wafer inspection |
Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh +1 more |
2018-06-05 |
| 9507907 |
Computational wafer inspection |
Christophe David Fouquet, Bernardo Kastrup, Arie Jeffrey Den Boef, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh +1 more |
2016-11-29 |
| 9188848 |
Maskless vortex phase shift optical direct write lithography |
Nicholas K. Eib, Ebo Croffie |
2015-11-17 |
| 8377633 |
Maskless vortex phase shift optical direct write lithography |
Nicholas K. Eib, Ebo Croffie |
2013-02-19 |
| 8057963 |
Maskless vortex phase shift optical direct write lithography |
Nicholas K. Eib, Ebo Croffie |
2011-11-15 |
| 8015540 |
Method and system for reducing inter-layer capacitance in integrated circuits |
Kunal N. Taravade, Paul G. Filseth |
2011-09-06 |
| 7738078 |
Optimized mirror design for optical direct write |
Nicholas K. Eib, Ebo Croffie |
2010-06-15 |
| 7499146 |
Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping |
Kars Zeger Troost, Johannes Jacobus Matheus Baselmans, Arno Jan Bleeker, Louis John Markoya, Nicholas K. Eib |
2009-03-03 |
| 7396760 |
Method and system for reducing inter-layer capacitance in integrated circuits |
Kunal N. Taravade, Paul G. Filseth |
2008-07-08 |
| 7376260 |
Method for post-OPC multi layer overlay quality inspection |
Nadya Belova |
2008-05-20 |
| 7372547 |
Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography |
Nicholas K. Eib, Ebo Croffie |
2008-05-13 |
| 7313508 |
Process window compliant corrections of design layout |
Ebo Croffie, Colin D. Yates, Nicholas K. Eib, Christopher Neville, Mario Garza |
2007-12-25 |
| 7270942 |
Optimized mirror design for optical direct write |
Nicholas K. Eib, Ebo Croffie |
2007-09-18 |
| 7189498 |
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process |
Nicholas K. Eib, Ebo Croffie |
2007-03-13 |
| 7149340 |
Mask defect analysis for both horizontal and vertical processing effects |
Paul G. Filseth, Kunal N. Taravade, Mario Garza |
2006-12-12 |
| 7005217 |
Chromeless phase shift mask |
George E. Bailey, John V. Jensen |
2006-02-28 |
| 6864020 |
Chromeless phase shift mask using non-linear optical materials |
Kunal N. Taravade |
2005-03-08 |
| 6782525 |
Wafer process critical dimension, alignment, and registration analysis simulation tool |
Mario Garza, George E. Bailey, Travis Brist, Paul G. Filseth |
2004-08-24 |
| 6775818 |
Device parameter and gate performance simulation based on wafer image prediction |
Kunal N. Taravade, Nadya Strelkova |
2004-08-10 |
