| 7381502 |
Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle |
Michael Berman |
2008-06-03 |
| 7298458 |
Optical error minimization in a semiconductor manufacturing apparatus |
Michael Berman |
2007-11-20 |
| 7098996 |
Optical error minimization in a semiconductor manufacturing apparatus |
Michael Berman |
2006-08-29 |
| 7023530 |
Dual source lithography for direct write application |
Michael Berman |
2006-04-04 |
| 7005217 |
Chromeless phase shift mask |
Neal Callan, John V. Jensen |
2006-02-28 |
| 6943055 |
Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer |
Michael Berman, Rennie Barber |
2005-09-13 |
| 6934929 |
Method for improving OPC modeling |
Travis Brist |
2005-08-23 |
| 6894762 |
Dual source lithography for direct write application |
Michael Berman |
2005-05-17 |
| 6885436 |
Optical error minimization in a semiconductor manufacturing apparatus |
Michael Berman |
2005-04-26 |
| 6866970 |
Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle |
Michael Berman |
2005-03-15 |
| 6782525 |
Wafer process critical dimension, alignment, and registration analysis simulation tool |
Mario Garza, Neal Callan, Travis Brist, Paul G. Filseth |
2004-08-24 |
| 6764749 |
Method to improve the resolution of a photolithography system by use of a coupling layer between the photo resist and the ARC |
Michael Berman |
2004-07-20 |
| 6627466 |
Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer |
Michael Berman, Rennie Barber |
2003-09-30 |
| 6102143 |
Shaped polycrystalline cutter elements |
Shelly R. Snyder, Eoin M. O'Tighearnaigh |
2000-08-15 |
