Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10908518 | Lithographic apparatus and method | Santiago E. DELPUERTO, Antonius Franciscus Johannes De Groot, Kenneth C. Henderson, Raymond Wilhelmus Louis Lafarre, Matthew Lipson +3 more | 2021-02-02 |
| 10649349 | Lithographic apparatus, a dryer and a method of removing liquid from a surface | Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Harry Sewell, Marcus Martinus Petrus Adrianus Vermeulen, Diane Elaine Markoya | 2020-05-12 |
| 10185231 | Lithographic apparatus, a dryer and a method of removing liquid from a surface | Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Harry Sewell, Marcus Martinus Petrus Adrianus Vermeulen, Diane Elaine Markoya | 2019-01-22 |
| 10001713 | Lithographic apparatus and method | Santiago del Puerto, Matthew Lipson, Kenneth C. Henderson, Raymond Wilhelmus Louis Lafarre, Tammo Uitterdijk +3 more | 2018-06-19 |
| 9632425 | Lithographic apparatus, a dryer and a method of removing liquid from a surface | Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Harry Sewell, Marcus Martinus Petrus Adrianus Vermeulen, Diane McCafferty | 2017-04-25 |
| 9330912 | Lithographic apparatus, fluid combining unit and device manufacturing method | Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Harry Sewell | 2016-05-03 |
| 8817226 | Systems and methods for insitu lens cleaning using ozone in immersion lithography | Harry Sewell | 2014-08-26 |
| 8736807 | Systems and methods for thermally-induced aberration correction in immersion lithography | Harry Sewell, Diane McCafferty | 2014-05-27 |
| 8654305 | Systems and methods for insitu lens cleaning in immersion lithography | Harry Sewell | 2014-02-18 |
| 8629970 | Immersion lithographic apparatus with immersion fluid re-circulating system | Harry Sewell, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Diane McCafferty | 2014-01-14 |
| 8451422 | Re-flow and buffer system for immersion lithography | Harry Sewell, Erik Theodorus Maria Bijlaart, Sjoerd Nicolaas Lambertus Donders, Diane McCafferty, Ralph Joseph Meijers | 2013-05-28 |
| 8203693 | Liquid immersion lithography system comprising a tilted showerhead relative to a substrate | Aleksandr Khmelichek, Harry Sewell, Erik Roelof Loopstra, Nicolaas Ten Kate | 2012-06-19 |
| 8045135 | Lithographic apparatus with a fluid combining unit and related device manufacturing method | Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Harry Sewell | 2011-10-25 |
| 7995185 | Systems and methods for thermally-induced aberration correction in immersion lithography | Harry Sewell, Diane McCafferty | 2011-08-09 |
| 7838310 | Tunable alignment geometry | — | 2010-11-23 |
| 7751030 | Interferometric lithographic projection apparatus | Aleksandr Khmelichek, Diane McCafferty, Harry Sewell, Justin Kreuzer | 2010-07-06 |
| 7684014 | Lithographic apparatus and device manufacturing method | Harry Sewell, Diane McCafferty | 2010-03-23 |
| 7534637 | Tunable alignment geometry | — | 2009-05-19 |
| 7499146 | Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping | Kars Zeger Troost, Johannes Jacobus Matheus Baselmans, Arno Jan Bleeker, Neal Callan, Nicholas K. Eib | 2009-03-03 |
| 7492442 | Adjustable resolution interferometric lithography system | Aleksandr Khmelichek, Harry Sewell | 2009-02-17 |
| 7474385 | Adjustable resolution interferometric lithography system | Aleksandr Khmelichek, Harry Sewell | 2009-01-06 |
| 7256864 | Liquid immersion lithography system having a tilted showerhead relative to a substrate | Nicolaas Ten Kate, Erik Roelof Loopstra, Aleksandr Khmelichek, Harry Sewell | 2007-08-14 |
| 7253879 | Liquid immersion lithography system with tilted liquid flow | Aleksandr Khmelichek, Harry Sewell | 2007-08-07 |
| 7112890 | Tunable alignment geometry | — | 2006-09-26 |
| 6967713 | Use of multiple reticles in lithographic printing tools | Andrew W. McCullough, Christopher Mason, Harry Sewell | 2005-11-22 |