Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7403266 | Maskless lithography systems and methods utilizing spatial light modulator arrays | Arno Jan Bleeker, Wenceslao A. Cebuhar, Jason Hintersteiner, Solomon Wasserman, Karel Diederick Van Der Mast | 2008-07-22 |
| 7105836 | Method and apparatus for cooling a reticle during lithographic exposure | Santiago del Puerto, Daniel N. Galburt, Stephen Roux, Joost Jeroen Ottens | 2006-09-12 |
| 7092070 | Illumination system with spatially controllable partial coherence compensating for line width variances | Gregg M. Gallatin | 2006-08-15 |
| 7029804 | Non absorbing reticle and method of making same | — | 2006-04-18 |
| 7014963 | Non absorbing reticle and method of making same | — | 2006-03-21 |
| 6967713 | Use of multiple reticles in lithographic printing tools | Christopher Mason, Louis John Markoya, Harry Sewell | 2005-11-22 |
| 6822728 | Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic system | Gregg M. Gallatin | 2004-11-23 |
| 6800408 | Use of multiple reticles in lithographic printing tools | Christopher Mason, Luis Markoya, Harry Sewell | 2004-10-05 |
| 6686101 | Non absorbing reticle and method of making same | — | 2004-02-03 |
| 6628370 | Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system | Gregg M. Gallatin | 2003-09-30 |
| 6628372 | Use of multiple reticles in lithographic printing tools | Christopher Mason, Louis John Markoya, Harry Sewell | 2003-09-30 |
| 6445439 | EUV reticle thermal management | — | 2002-09-03 |
| 6444372 | Non absorbing reticle and method of making same | — | 2002-09-03 |
| 6292255 | Dose correction for along scan linewidth variation | — | 2001-09-18 |
| 6259513 | Illumination system with spatially controllable partial coherence | Gregg M. Gallatin | 2001-07-10 |
| 6097474 | Dynamically adjustable high resolution adjustable slit | Pradeep K. Govil, Daniel N. Galburt, David Callan | 2000-08-01 |
| 6013401 | Method of controlling illumination field to reduce line width variation | Pradeep K. Govil, Daniel N. Galburt, David Callan | 2000-01-11 |
| 5973764 | Vacuum assisted debris removal system | Sean Olson | 1999-10-26 |
| 5966202 | Adjustable slit | — | 1999-10-12 |
| 5896188 | Reduction of pattern noise in scanning lithographic system illuminators | — | 1999-04-20 |
| 5895737 | Method for adjusting an illumination field based on selected reticle feature | Pradeep K. Govil | 1999-04-20 |
| 5767523 | Multiple detector alignment system for photolithography | — | 1998-06-16 |
| 5079131 | Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations | James W. Thackeray | 1992-01-07 |