Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8259285 | Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data | Kars Zeger Troost, Jason Hintersteiner, Patricius Aloysius Jacobus Tinnemans, Ronald Peter Albright, Bernardo Kastrup | 2012-09-04 |
| 7936445 | Altering pattern data based on measured optical element characteristics | Jason Hintersteiner, Patricius Aloysius Jacobus Tinnemans | 2011-05-03 |
| 7859735 | Systems and methods for minimizing scattered light in multi-SLM maskless lithography | Jason Hintersteiner, Stan Janik, Yuli Vladimirsky | 2010-12-28 |
| 7773199 | Methods and systems to compensate for a stitching disturbance of a printed pattern | Arno Jan Bleeker, Justin Kreuzer, Azat Latypov, Yuli Vladimirsky | 2010-08-10 |
| 7688423 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones | Arno Jan Bleeker, Azat Latypov | 2010-03-30 |
| 7630054 | Methods and systems to compensate for a stitching disturbance of a printed pattern | Arno Jan Bleeker, Justin Kreuzer, Azat Latypov, Yuli Vladimirsky | 2009-12-08 |
| 7567368 | Systems and methods for minimizing scattered light in multi-SLM maskless lithography | Jason Hintersteiner, Stan Janik, Yuli Vladimirsky | 2009-07-28 |
| 7542013 | System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode | Azat Latypov, Jason Hintersteiner | 2009-06-02 |
| 7469058 | Method and system for a maskless lithography rasterization technique based on global optimization | Azat Latypov, Sherman K. Poultney | 2008-12-23 |
| 7463402 | Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography | Jason Hintersteiner, Azat Latypov, Gerald Volpe | 2008-12-09 |
| 7410736 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones | Arno Jan Bleeker, Azat Latypov | 2008-08-12 |
| 7403266 | Maskless lithography systems and methods utilizing spatial light modulator arrays | Arno Jan Bleeker, Jason Hintersteiner, Andrew W. McCullough, Solomon Wasserman, Karel Diederick Van Der Mast | 2008-07-22 |
| 7158307 | Efficiently illuminating a modulating device | Scott Coston, Jason Hintersteiner | 2007-01-02 |
| 7133121 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region | Arno Jan Bleeker, Justin Kreuzer, Azat Latypov, Yuli Vladimirsky | 2006-11-07 |
| 7061591 | Maskless lithography systems and methods utilizing spatial light modulator arrays | Arno Jan Bleeker, Jason Hintersteiner | 2006-06-13 |
| 7006295 | Illumination system and method for efficiently illuminating a pattern generator | Scott Coston, Jason Hintersteiner | 2006-02-28 |
| 6985280 | Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography | Jason Hintersteiner, Azat Latypov, Gerald Volpe | 2006-01-10 |
| 6876440 | METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION | Arno Jan Bleeker, Justin Kreuzer, Azat Latypov, Yuli Vladimirsky | 2005-04-05 |
| 6831768 | Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography | Jason Hintersteiner, Azat Latypov, Gerald Volpe | 2004-12-14 |