Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11960216 | Invariable magnification multilevel optical device with telecentric converter | Lev Ryzhikov | 2024-04-16 |
| 11754935 | Lithographic patterning device multichannel position and level gauge | Lev Ryzhikov | 2023-09-12 |
| 10156527 | Compact two-sided reticle inspection system | Stanley G. Janik, James H. Walsh | 2018-12-18 |
| 9594030 | Lithographic apparatus and device manufacturing method | Robert Albert Tharaldsen | 2017-03-14 |
| 9411244 | Optical system, inspection system and manufacturing method | Lev Ryzhikov, James H. Walsh | 2016-08-09 |
| 8692977 | Optical system, inspection system and manufacturing method | Lev Ryzhikov, James H. Walsh | 2014-04-08 |
| 8681313 | Diffraction elements for alignment targets | Muhammad Arif, Robert Albert Tharaldsen | 2014-03-25 |
| 8634054 | Particle detection on an object surface | James H. Walsh | 2014-01-21 |
| 8558988 | Thin film continuous spatially modulated grey attenuators and filters | Lev Ryzhikov, Ronald A. Wilklow | 2013-10-15 |
| 7859735 | Systems and methods for minimizing scattered light in multi-SLM maskless lithography | Wenceslao A. Cebuhar, Jason Hintersteiner, Stan Janik | 2010-12-28 |
| 7859756 | Optical system for transforming numerical aperture | Lev Ryzhikov | 2010-12-28 |
| 7773199 | Methods and systems to compensate for a stitching disturbance of a printed pattern | Arno Jan Bleeker, Wenceslao A. Cebuhar, Justin Kreuzer, Azat Latypov | 2010-08-10 |
| 7768653 | Method and system for wavefront measurements of an optical system | Azat Latypov, Sherman K. Poultney | 2010-08-03 |
| 7630054 | Methods and systems to compensate for a stitching disturbance of a printed pattern | Arno Jan Bleeker, Wenceslao A. Cebuhar, Justin Kreuzer, Azat Latypov | 2009-12-08 |
| 7567368 | Systems and methods for minimizing scattered light in multi-SLM maskless lithography | Wenceslao A. Cebuhar, Jason Hintersteiner, Stan Janik | 2009-07-28 |
| 7532403 | Optical system for transforming numerical aperture | Lev Ryzhikov | 2009-05-12 |
| 7411687 | Speckle reduction method and system for EUV interferometry | Richard Gontin | 2008-08-12 |
| 7242456 | System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions | Lev Ryzhikov, Lev Sakin | 2007-07-10 |
| 7227613 | Lithographic apparatus having double telecentric illumination | Lev Ryzhikov | 2007-06-05 |
| 7133121 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region | Arno Jan Bleeker, Wenceslao A. Cebuhar, Justin Kreuzer, Azat Latypov | 2006-11-07 |
| 6876440 | METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION | Arno Jan Bleeker, Wenceslao A. Cebuhar, Justin Kreuzer, Azat Latypov | 2005-04-05 |
| 6383697 | Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction | Antony Bourdillon | 2002-05-07 |
| 6093520 | High aspect ratio microstructures and methods for manufacturing microstructures | Olga Vladimirsky, Volker Saile | 2000-07-25 |
| 5846727 | Microsystem for rapid DNA sequencing | Steven A. Soper, Jack D. Davies | 1998-12-08 |
| 5235626 | Segmented mask and exposure system for x-ray lithography | Alexander L. Flamholz, Robert P. Rippstein, Chester Wasik | 1993-08-10 |