| 10267360 |
Pneumatic bearing with bonded polymer film wear surface and production method thereof |
Dragos Pariza |
2019-04-23 |
$18,404,000 |
| 10001713 |
Lithographic apparatus and method |
Matthew Lipson, Kenneth C. Henderson, Raymond Wilhelmus Louis Lafarre, Louis John Markoya, Tammo Uitterdijk +3 more |
2018-06-19 |
$15,802,000 |
| 9377700 |
Determining position and curvature information directly from a surface of a patterning device |
Mark Josef Schuster, Daniel Nathan Burbank, Duncan Walter Bromley, Franciscus Godefridus Casper Bijnen |
2016-06-28 |
$5,146,000 |
| 9229341 |
Reticle support that reduces reticle slippage |
Enrico Zordan |
2016-01-05 |
$2,770,000 |
| 8625070 |
Lithographic apparatus, projection system and damper for use in a lithographic apparatus and device manufacturing method |
Windy Lynn Farnsworth, Samir Nayfeh |
2014-01-07 |
$6,333,000 |
| 8553207 |
Optically compensated unidirectional reticle bender |
— |
2013-10-08 |
$5,285,000 |
| 8446570 |
System and method for using a two part cover and a box for protecting a reticle |
Erik Roelof Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen +1 more |
2013-05-21 |
$3,218,000 |
| 7894140 |
Compensation techniques for fluid and magnetic bearings |
Roberto B. Wiener |
2011-02-22 |
$5,097,000 |
| 7830497 |
System and method for using a two part cover and a box for protecting a reticle |
Erik Roelof Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen +1 more |
2010-11-09 |
$5,067,000 |
| 7697115 |
Resonant scanning mirror |
— |
2010-04-13 |
$2,995,000 |
| 7304720 |
System for using a two part cover for protecting a reticle |
Eric R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson +1 more |
2007-12-04 |
$6,677,000 |
| 7298459 |
Wafer handling method for use in lithography patterning |
Stephen Roux, Justin Kreuzer |
2007-11-20 |
$6,742,000 |
| 7290931 |
Vacuum pre-loaded pneumatic bearing with onboard vacuum generator |
Geoffrey B. Wardman |
2007-11-06 |
$3,303,000 |
| 7249925 |
System and method for reticle protection and transport |
Michael DeMarco, Glenn Friedman, Jorge Ivaldi, James McClay |
2007-07-31 |
$2,906,000 |
| 7163301 |
Method and apparatus for managing actinic intensity transients in a lithography mirror |
— |
2007-01-16 |
$7,378,000 |
| 7105836 |
Method and apparatus for cooling a reticle during lithographic exposure |
Daniel N. Galburt, Andrew W. McCullough, Stephen Roux, Joost Jeroen Ottens |
2006-09-12 |
$2,938,000 |
| 7057711 |
Lithography tool having a vacuum reticle library coupled to a vacuum chamber |
Markus Franciscus Antonius Eurlings |
2006-06-06 |
$2,887,000 |
| 7025498 |
System and method of measuring thermal expansion |
— |
2006-04-11 |
$3,039,000 |
| 7009359 |
Foam core chuck for the scanning stage of a lithography system |
— |
2006-03-07 |
$3,842,000 |
| 7009685 |
Bearing arrangement for reaction mass in a controlled environment |
— |
2006-03-07 |
$3,842,000 |
| 6994444 |
Method and apparatus for managing actinic intensity transients in a lithography mirror |
— |
2006-02-07 |
$3,756,000 |
| 6991416 |
System and method for reticle protection and transport |
Michael DeMarco, Glenn Friedman, Jorge Ivaldi, James McClay |
2006-01-31 |
$4,469,000 |
| 6947125 |
Bearing arrangement for reaction mass in a controlled environment |
— |
2005-09-20 |
$2,862,000 |
| 6927842 |
Wafer handling method for use in lithography patterning |
Stephen Roux, Justin Kreuzer |
2005-08-09 |
$4,667,000 |
| 6906783 |
System for using a two part cover for protecting a reticle |
Erik Roelof Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson +1 more |
2005-06-14 |
$2,333,000 |
