Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10267360 | Pneumatic bearing with bonded polymer film wear surface and production method thereof | Dragos Pariza | 2019-04-23 |
| 10001713 | Lithographic apparatus and method | Matthew Lipson, Kenneth C. Henderson, Raymond Wilhelmus Louis Lafarre, Louis John Markoya, Tammo Uitterdijk +3 more | 2018-06-19 |
| 9377700 | Determining position and curvature information directly from a surface of a patterning device | Mark Josef Schuster, Daniel Nathan Burbank, Duncan Walter Bromley, Franciscus Godefridus Casper Bijnen | 2016-06-28 |
| 9229341 | Reticle support that reduces reticle slippage | Enrico Zordan | 2016-01-05 |
| 8625070 | Lithographic apparatus, projection system and damper for use in a lithographic apparatus and device manufacturing method | Windy Lynn Farnsworth, Samir Nayfeh | 2014-01-07 |
| 8553207 | Optically compensated unidirectional reticle bender | — | 2013-10-08 |
| 8446570 | System and method for using a two part cover and a box for protecting a reticle | Erik Roelof Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen +1 more | 2013-05-21 |
| 7894140 | Compensation techniques for fluid and magnetic bearings | Roberto B. Wiener | 2011-02-22 |
| 7830497 | System and method for using a two part cover and a box for protecting a reticle | Erik Roelof Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen +1 more | 2010-11-09 |
| 7697115 | Resonant scanning mirror | — | 2010-04-13 |
| 7304720 | System for using a two part cover for protecting a reticle | Eric R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson +1 more | 2007-12-04 |
| 7298459 | Wafer handling method for use in lithography patterning | Stephen Roux, Justin Kreuzer | 2007-11-20 |
| 7290931 | Vacuum pre-loaded pneumatic bearing with onboard vacuum generator | Geoffrey B. Wardman | 2007-11-06 |
| 7249925 | System and method for reticle protection and transport | Michael DeMarco, Glenn Friedman, Jorge Ivaldi, James McClay | 2007-07-31 |
| 7163301 | Method and apparatus for managing actinic intensity transients in a lithography mirror | — | 2007-01-16 |
| 7105836 | Method and apparatus for cooling a reticle during lithographic exposure | Daniel N. Galburt, Andrew W. McCullough, Stephen Roux, Joost Jeroen Ottens | 2006-09-12 |
| 7057711 | Lithography tool having a vacuum reticle library coupled to a vacuum chamber | Markus Franciscus Antonius Eurlings | 2006-06-06 |
| 7025498 | System and method of measuring thermal expansion | — | 2006-04-11 |
| 7009359 | Foam core chuck for the scanning stage of a lithography system | — | 2006-03-07 |
| 7009685 | Bearing arrangement for reaction mass in a controlled environment | — | 2006-03-07 |
| 6994444 | Method and apparatus for managing actinic intensity transients in a lithography mirror | — | 2006-02-07 |
| 6991416 | System and method for reticle protection and transport | Michael DeMarco, Glenn Friedman, Jorge Ivaldi, James McClay | 2006-01-31 |
| 6947125 | Bearing arrangement for reaction mass in a controlled environment | — | 2005-09-20 |
| 6927842 | Wafer handling method for use in lithography patterning | Stephen Roux, Justin Kreuzer | 2005-08-09 |
| 6906783 | System for using a two part cover for protecting a reticle | Erik Roelof Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson +1 more | 2005-06-14 |