Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9977351 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more | 2018-05-22 |
| 9766557 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more | 2017-09-19 |
| 9632433 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more | 2017-04-25 |
| 9632434 | Reticle cooling system in a lithographic apparatus | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +6 more | 2017-04-25 |
| 8446570 | System and method for using a two part cover and a box for protecting a reticle | Santiago del Puerto, Erik Roelof Loopstra, Andrew Massar, Duane P. Kish, Woodrow J. Olsen +1 more | 2013-05-21 |
| 7830497 | System and method for using a two part cover and a box for protecting a reticle | Santiago del Puerto, Erik Roelof Loopstra, Andrew Massar, Duane P. Kish, Woodrow J. Olsen +1 more | 2010-11-09 |
| 7304720 | System for using a two part cover for protecting a reticle | Santiago del Puerto, Eric R. Loopstra, Andrew Massar, Duane P. Kish, Woodrow J. Olson +1 more | 2007-12-04 |
| 7209220 | System for using a two part cover for and a box for protecting a reticle | Santiago del Puerto, Erik Roelof Loopstra, Andrew Massar, Duane P. Kish, Woodrow J. Olson +1 more | 2007-04-24 |
| 6906783 | System for using a two part cover for protecting a reticle | Santiago del Puerto, Erik Roelof Loopstra, Andrew Massar, Duane P. Kish, Woodrow J. Olson +1 more | 2005-06-14 |