| 9632425 |
Lithographic apparatus, a dryer and a method of removing liquid from a surface |
Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Harry Sewell, Louis John Markoya, Marcus Martinus Petrus Adrianus Vermeulen |
2017-04-25 |
| 8736807 |
Systems and methods for thermally-induced aberration correction in immersion lithography |
Harry Sewell, Louis John Markoya |
2014-05-27 |
| 8629970 |
Immersion lithographic apparatus with immersion fluid re-circulating system |
Harry Sewell, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Louis John Markoya |
2014-01-14 |
| 8451422 |
Re-flow and buffer system for immersion lithography |
Harry Sewell, Erik Theodorus Maria Bijlaart, Sjoerd Nicolaas Lambertus Donders, Louis John Markoya, Ralph Joseph Meijers |
2013-05-28 |
| 7995185 |
Systems and methods for thermally-induced aberration correction in immersion lithography |
Harry Sewell, Louis John Markoya |
2011-08-09 |
| 7751030 |
Interferometric lithographic projection apparatus |
Louis John Markoya, Aleksandr Khmelichek, Harry Sewell, Justin Kreuzer |
2010-07-06 |
| 7684014 |
Lithographic apparatus and device manufacturing method |
Harry Sewell, Louis John Markoya |
2010-03-23 |