Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6969683 | Method of preventing resist poisoning in dual damascene structures | Rongxiang Hu, Yongbae Kim, Sang-Yun Lee, Hiroaki Takikawa, Shumay X. Dou +5 more | 2005-11-29 |
| 6713386 | Method of preventing resist poisoning in dual damascene structures | Rongxiang Hu, Yongbae Kim, Sang-Yun Lee, Hiroaki Takikawa, Shumay X. Dou +5 more | 2004-03-30 |
| 6532585 | Method and apparatus for application of proximity correction with relative segmentation | Dusan Petranovic, Ranko Scepanovic, Edwin Jones, Richard Schinella, Nicholas F. Pasch +3 more | 2003-03-11 |
| 6499003 | Method and apparatus for application of proximity correction with unitary segmentation | Edwin Jones, Dusan Petranovic, Ranko Scepanovic, Richard Schinella, Nicholas F. Pasch +3 more | 2002-12-24 |
| 6282696 | Performing optical proximity correction with the aid of design rule checkers | Mario Garza, Nicholas K. Eib, John V. Jensen | 2001-08-28 |
| 6269472 | Optical proximity correction method and apparatus | Mario Garza, John V. Jensen, Nicholas K. Eib | 2001-07-31 |
| 6175953 | Method and apparatus for general systematic application of proximity correction | Ranko Scepanovic, Dusan Petranovic, Edwin Jones, Richard Schinella, Nicholas F. Pasch +3 more | 2001-01-16 |
| 6174630 | Method of proximity correction with relative segmentation | Dusan Petranovic, Ranko Scepanovic, Edwin Jones, Richard Schinella, Nicholas F. Pasch +3 more | 2001-01-16 |
| 6157087 | Consistent alignment mark profiles on semiconductor wafers using metal organic chemical vapor deposition titanium nitride protective layer | Joe W. Zhao, Shumay X. Dou | 2000-12-05 |
| 6109775 | Method for adjusting the density of lines and contact openings across a substrate region for improving the chemical-mechanical polishing of a thin-film later disposed thereon | Prabhakar P. Tripathi, Ratan K. Choudhury, Gauri C. Das, Nicholas K. Eib, Ashok K. Kapoor +1 more | 2000-08-29 |
| 6081659 | Comparing aerial image to actual photoresist pattern for masking process characterization | Mario Garza | 2000-06-27 |
| 6078738 | Comparing aerial image to SEM of photoresist or substrate pattern for masking process characterization | Mario Garza | 2000-06-20 |
| 6060787 | Consistent alignment mark profiles on semiconductor wafers using fine grain tungsten protective layer | Joe W. Zhao, Shumay X. Dou | 2000-05-09 |
| 5981352 | Consistent alignment mark profiles on semiconductor wafers using fine grain tungsten protective layer | Joe W. Zhao, Shumay X. Dou | 1999-11-09 |
| 5966613 | Consistent alignment mark profiles on semiconductor wafers using metal organic chemical vapor deposition titanium nitride protective | Joe W. Zhao, Shumay X. Dou | 1999-10-12 |
| 5900338 | Performing optical proximity correction with the aid of design rule checkers | Mario Garza, Nicholas K. Eib, John V. Jensen | 1999-05-04 |
| 5804340 | Photomask inspection method and inspection tape therefor | Mario Garza | 1998-09-08 |
| 5723233 | Optical proximity correction method and apparatus | Mario Garza, Nicholas K. Eib | 1998-03-03 |
| 5705301 | Performing optical proximity correction with the aid of design rule checkers | Mario Garza, Nicholas K. Eib, John V. Jensen | 1998-01-06 |
| 5663017 | Optical corrective techniques with reticle formation and reticle stitching to provide design flexibility | Richard Schinella | 1997-09-02 |
| 5652163 | Use of reticle stitching to provide design flexibility | Richard Schinella | 1997-07-29 |
| 5549934 | Process of curing hydrogen silsesquioxane coating to form silicon oxide layer | Mario Garza | 1996-08-27 |
| 5456952 | Process of curing hydrogen silsesquioxane coating to form silicon oxide layer | Mario Garza | 1995-10-10 |