Issued Patents All Time
Showing 1–25 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10615009 | System implementing machine learning in complex multivariate wafer processing equipment | Joydeep Guha, John Daugherty, Richard A. Gottscho | 2020-04-07 |
| 10585347 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Saravanapriyan Sriraman, Richard Wise, Harmeet Singh, Alex Paterson, Andrew D. Bailey, III +1 more | 2020-03-10 |
| 10403475 | Tunable multi-zone gas injection system | David Cooperberg, Douglas Ratto, Harmeet Singh, Neil Benjamin | 2019-09-03 |
| 10242883 | High aspect ratio etch of oxide metal oxide metal stack | Joydeep Guha, Sirish Reddy, Kaushik Chattopadhyay, Thomas W. Mountsier, Aaron Eppler +2 more | 2019-03-26 |
| 10224221 | Internal plasma grid for semiconductor fabrication | Harmeet Singh, Thorsten Lill, Alex Paterson, Monica Titus, Gowri Kamarthy | 2019-03-05 |
| 10197908 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Saravanapriyan Sriraman, Richard Wise, Harmeet Singh, Alex Paterson, Andrew D. Bailey, III +1 more | 2019-02-05 |
| 10056225 | Adjusting substrate temperature to improve CD uniformity | Keith Gaff, Harmeet Singh, Keith Comendant | 2018-08-21 |
| 9972478 | Method and process of implementing machine learning in complex multivariate wafer processing equipment | Joydeep Guha, John Daugherty, Richard A. Gottscho | 2018-05-15 |
| 9818633 | Equipment front end module for transferring wafers and method of transferring wafers | Thorsten Lill, Candi Kristoffersen, Andrew D. Bailey, III, Meihua Shen, Rangesh Raghavan +1 more | 2017-11-14 |
| 9659783 | High aspect ratio etch with combination mask | Joydeep Guha, Sirish Reddy, Kaushik Chattopadhyay, Thomas W. Mountsier, Aaron Eppler +2 more | 2017-05-23 |
| 9245761 | Internal plasma grid for semiconductor fabrication | Harmeet Singh, Thorsten Lill, Alex Paterson, Monica Titus, Gowri Kamarthy | 2016-01-26 |
| 9018103 | High aspect ratio etch with combination mask | Joydeep Guha, Sirish Reddy, Kaushik Chattopadhyay, Thomas W. Mountsier, Aaron Eppler +2 more | 2015-04-28 |
| 8642480 | Adjusting substrate temperature to improve CD uniformity | Keith Gaff, Harmeet Singh, Keith Comendant | 2014-02-04 |
| 8525139 | Method and apparatus of halogen removal | Harmeet Singh, Sanket Sant, Shang-I Chou, Raphael Casaes, Seetharaman Ramachandran | 2013-09-03 |
| 7932181 | Edge gas injection for critical dimension uniformity improvement | Harmeet Singh, David Cooperberg | 2011-04-26 |
| 7682980 | Method to improve profile control and N/P loading in dual doped gate applications | Helene Del Puppo, Frank Y. Lin, Chris Lee, Thomas A. Kamp, Alan J. Miller +2 more | 2010-03-23 |
| 7578945 | Method and apparatus for tuning a set of plasma processing steps | John Daugherty, Harmeet Singh, Anthony Chen | 2009-08-25 |
| 7204934 | Method for planarization etch with in-situ monitoring by interferometry prior to recess etch | Linda Braly, Erik A. Edelberg, Alan J. Miller | 2007-04-17 |
| RE39534 | Method and apparatus to calibrate a semi-empirical process simulator | David Cooperberg, Richard A. Gottscho | 2007-03-27 |
| 7186661 | Method to improve profile control and N/P loading in dual doped gate applications | Helene Del Puppo, Frank Y. Lin, Chris Lee, Thomas A. Kamp, Alan J. Miller +2 more | 2007-03-06 |
| 7138067 | Methods and apparatus for tuning a set of plasma processing steps | John Daugherty, Harmeet Singh, Anthony Chen | 2006-11-21 |
| 7139632 | Enhanced process and profile simulator algorithms | David Cooperberg | 2006-11-21 |
| 7018780 | Methods for controlling and reducing profile variation in photoresist trimming | Linda Braly | 2006-03-28 |
| 6994769 | In-situ cleaning of a polymer coated plasma processing chamber | Harmeet Singh, John Daugherty, Saurabh Ullal | 2006-02-07 |
| 6921724 | Variable temperature processes for tunable electrostatic chuck | Tom A. Kamp, Richard A. Gottscho, Steve Lee, Chris Lee, Yoko Yamaguchi +1 more | 2005-07-26 |