Issued Patents All Time
Showing 25 most recent of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12417916 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Samantha Tan, Yu Jiang, Hui-Jung Wu, Yang Pan +2 more | 2025-09-16 |
| 12315727 | Eliminating yield impact of stochastics in lithography | Nader Shamma, Jengyi Yu, Samantha Tan | 2025-05-27 |
| 12278125 | Integrated dry processes for patterning radiation photoresist patterning | Jengyi Yu, Samantha Tan, Mohammed Haroon Alvi, Yang Pan, Richard A. Gottscho +5 more | 2025-04-15 |
| 12183589 | Tin oxide mandrels in patterning | Jengyi Yu, Samantha Tan, Seongjun Heo, Boris Volosskiy, Sivananda K. Kanakasabapathy +2 more | 2024-12-31 |
| 12183604 | Integrated dry processes for patterning radiation photoresist patterning | Jengyi Yu, Samantha Tan, Mohammed Haroon Alvi, Yang Pan, Richard A. Gottscho +5 more | 2024-12-31 |
| 12094711 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Samantha Tan, Yu Jiang, Hui-Jung Wu, Yang Pan +2 more | 2024-09-17 |
| 12062538 | Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement | Jengyi Yu, Samantha Tan, Liu-Yang Yang, Chen-Wei Liang, Boris Volosskiy +4 more | 2024-08-13 |
| 12051589 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Arpan Mahorowala, Patrick A. Van Cleemput, Bart J. van Schravendijk | 2024-07-30 |
| 11987876 | Chamfer-less via integration scheme | Sivananda K. Kanakasabapathy, Hui-Jung Wu, Arpan Mahorowala | 2024-05-21 |
| 11784047 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Arpan Mahorowala, Patrick A. Van Cleemput, Bart J. van Schravendijk | 2023-10-10 |
| 11355353 | Tin oxide mandrels in patterning | Jengyi Yu, Samantha Tan, Seongjun Heo, Boris Volosskiy, Sivananda K. Kanakasabapathy +2 more | 2022-06-07 |
| 11322351 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Samantha Tan, Yu Jiang, Hui-Jung Wu, Yang Pan +2 more | 2022-05-03 |
| 11257674 | Eliminating yield impact of stochastics in lithography | Nader Shamma, Jengyi Yu, Samantha Tan | 2022-02-22 |
| 11183383 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Arpan Mahorowala, Patrick A. Van Cleemput, Bart J. van Schravendijk | 2021-11-23 |
| 11031245 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Arpan Mahorowala, Patrick A. Van Cleemput, Bart J. van Schravendijk | 2021-06-08 |
| 10796912 | Eliminating yield impact of stochastics in lithography | Nader Shamma, Jengyi Yu, Samantha Tan | 2020-10-06 |
| 10685836 | Etching substrates using ALE and selective deposition | Samantha Tan, Jengyi Yu, Nader Shamma, Yang Pan | 2020-06-16 |
| 10585347 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Saravanapriyan Sriraman, Harmeet Singh, Alex Paterson, Andrew D. Bailey, III, Vahid Vahedi +1 more | 2020-03-10 |
| 10546748 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Samantha Tan, Yu Jiang, Hui-Jung Wu, Yang Pan +2 more | 2020-01-28 |
| 10534257 | Layout pattern proximity correction through edge placement error prediction | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Andrew D. Bailey, III | 2020-01-14 |
| 10438807 | Low roughness EUV lithography | Nader Shamma | 2019-10-08 |
| 10304659 | Ale smoothness: in and outside semiconductor industry | Keren Jacobs Kanarik, Samantha Tan, Thorsten Lill, Meihua Shen, Yang Pan +1 more | 2019-05-28 |
| 10269566 | Etching substrates using ale and selective deposition | Samantha Tan, Jengyi Yu, Nader Shamma, Yang Pan | 2019-04-23 |
| 10197908 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Saravanapriyan Sriraman, Harmeet Singh, Alex Paterson, Andrew D. Bailey, III, Vahid Vahedi +1 more | 2019-02-05 |
| 9984858 | ALE smoothness: in and outside semiconductor industry | Keren Jacobs Kanarik, Samantha Tan, Thorsten Lill, Meihua Shen, Yang Pan +1 more | 2018-05-29 |