Issued Patents All Time
Showing 1–25 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12372872 | Extreme ultraviolet (EUV) lithography using an intervening layer or a multi-layer stack with varying mean free paths for secondary electron generation | Andrew Xiao Liang, Nader Shamma, Rich Wise, Akhil Singhal, Gregory Blachut +1 more | 2025-07-29 |
| 12051589 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Richard Wise, Patrick A. Van Cleemput, Bart J. van Schravendijk | 2024-07-30 |
| 11987876 | Chamfer-less via integration scheme | Sivananda K. Kanakasabapathy, Hui-Jung Wu, Richard Wise | 2024-05-21 |
| 11869770 | Selective deposition of etch-stop layer for enhanced patterning | Nagraj Shankar, Kapu Sirish Reddy, Jon Henri, Pengyi Zhang, Elham Mohimi +1 more | 2024-01-09 |
| 11784047 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Richard Wise, Patrick A. Van Cleemput, Bart J. van Schravendijk | 2023-10-10 |
| 11183383 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Richard Wise, Patrick A. Van Cleemput, Bart J. van Schravendijk | 2021-11-23 |
| 11094542 | Selective deposition of etch-stop layer for enhanced patterning | Nagraj Shankar, Kapu Sirish Reddy, Jon Henri, Pengyi Zhang, Elham Mohimi +1 more | 2021-08-17 |
| 11031245 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Richard Wise, Patrick A. Van Cleemput, Bart J. van Schravendijk | 2021-06-08 |
| 10566194 | Selective deposition of etch-stop layer for enhanced patterning | Nagraj Shankar, Kapu Sirish Reddy, Jon Henri, Pengyi Zhang, Elham Mohimi +1 more | 2020-02-18 |
| 10074543 | High dry etch rate materials for semiconductor patterning applications | Ishtak Karim, Purushottam Kumar, Shankar Swaminathan, Adrien LaVoie | 2018-09-11 |
| 9824893 | Tin oxide thin film spacers in semiconductor device manufacturing | David Charles Smith, Richard Wise, Patrick A. Van Cleemput, Bart J. van Schravendijk | 2017-11-21 |
| 9059000 | Methods and structures for protecting one area while processing another area on a chip | Deok-kee Kim, Kenneth T. Settlemyer, Jr., Kangguo Cheng, Ramachandra Divakaruni, Carl Radens +4 more | 2015-06-16 |
| 8609322 | Process of making a lithographic structure using antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Allen H. Gabor, Scott D. Halle +1 more | 2013-12-17 |
| 8293454 | Process of making a lithographic structure using antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Allen H. Gabor, Scott D. Halle +1 more | 2012-10-23 |
| 7968270 | Process of making a semiconductor device using multiple antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Richard A. Conti, Allen H. Gabor +2 more | 2011-06-28 |
| 7648820 | Antireflective hardmask and uses thereof | Katherina Babich, Elbert E. Huang, David R. Medeiros, Dirk Pfeiffer, Karen Temple | 2010-01-19 |
| 7545041 | Techniques for patterning features in semiconductor devices | Scott D. Allen, Katherina Babich, Steven J. Holmes, Dirk Pfeiffer, Richard Wise | 2009-06-09 |
| 7497959 | Methods and structures for protecting one area while processing another area on a chip | Deok-kee Kim, Kenneth T. Settlemyer, Jr., Kangguo Cheng, Ramachandra Divakaruni, Carl Radens +4 more | 2009-03-03 |
| 7485573 | Process of making a semiconductor device using multiple antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Richard A. Conti, Allen H. Gabor +2 more | 2009-02-03 |
| 7344991 | Method and apparatus for multilayer photoresist dry development | Vaidyanathan Balasubramaniam, Koichiro Inazawa, Rich Wise, Siddhartha Panda | 2008-03-18 |
| 7326442 | Antireflective composition and process of making a lithographic structure | Katherina Babich, Sean D. Burns, Elbert E. Huang, Dirk Pfeiffer, Karen Temple | 2008-02-05 |
| 7223517 | Lithographic antireflective hardmask compositions and uses thereof | Katherina Babich, David R. Medeiros, Dirk Pfeiffer | 2007-05-29 |
| 7175966 | Water and aqueous base soluble antireflective coating/hardmask materials | Katherina Babich, Alfred Grill, Dirk Pfeiffer | 2007-02-13 |
| 7172849 | Antireflective hardmask and uses thereof | Katherina Babich, Elbert E. Huang, David R. Medeiros, Dirk Pfeiffer, Karen Temple | 2007-02-06 |
| 7172969 | Method and system for etching a film stack | Annie Xia, Hiromasa Mochiki | 2007-02-06 |