Issued Patents All Time
Showing 25 most recent of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12266535 | Mask encapsulation to prevent degradation during fabrication of high aspect ratio features | Kapu Sirish Reddy, Francis Sloan Roberts | 2025-04-01 |
| 12249514 | Carbon based depositions used for critical dimension control during high aspect ratio feature etches and for forming protective layers | Karthik S. Colinjivadi, Francis Sloan Roberts, Kapu Sirish Reddy, Samantha Tan, Shih-Ked Lee +4 more | 2025-03-11 |
| 11869770 | Selective deposition of etch-stop layer for enhanced patterning | Nagraj Shankar, Kapu Sirish Reddy, Pengyi Zhang, Elham Mohimi, Bhavin Jariwala +1 more | 2024-01-09 |
| 11107683 | Selective growth of metal-containing hardmask thin films | David Charles Smith, Dennis M. Hausmann, Paul C. Lemaire | 2021-08-31 |
| 11094542 | Selective deposition of etch-stop layer for enhanced patterning | Nagraj Shankar, Kapu Sirish Reddy, Pengyi Zhang, Elham Mohimi, Bhavin Jariwala +1 more | 2021-08-17 |
| 11075127 | Suppressing interfacial reactions by varying the wafer temperature throughout deposition | Seshasayee Varadarajan, Aaron R. Fellis, Andrew John McKerrow, James S. Sims, Ramesh Chandrasekharan | 2021-07-27 |
| 10804099 | Selective inhibition in atomic layer deposition of silicon-containing films | Dennis M. Hausmann, Bart J. van Schravendijk, Shane Tang, Karl Leeser | 2020-10-13 |
| 10741458 | Methods for depositing films on sensitive substrates | Hu Kang, Shankar Swaminathan, Adrien LaVoie | 2020-08-11 |
| 10643846 | Selective growth of metal-containing hardmask thin films | David Charles Smith, Dennis M. Hausmann, Paul C. Lemaire | 2020-05-05 |
| 10566194 | Selective deposition of etch-stop layer for enhanced patterning | Nagraj Shankar, Kapu Sirish Reddy, Pengyi Zhang, Elham Mohimi, Bhavin Jariwala +1 more | 2020-02-18 |
| 10347547 | Suppressing interfacial reactions by varying the wafer temperature throughout deposition | Seshasayee Varadarajan, Aaron R. Fellis, Andrew John McKerrow, James S. Sims, Ramesh Chandrasekharan | 2019-07-09 |
| 10043655 | Plasma activated conformal dielectric film deposition | Shankar Swaminathan, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan +3 more | 2018-08-07 |
| 10020188 | Method for depositing ALD films using halide-based precursors | James S. Sims, Ramesh Chandrasekharan, Andrew John McKerrow, Seshasayee Varadarajan, Kathryn M. Kelchner | 2018-07-10 |
| 10008428 | Methods for depositing films on sensitive substrates | Hu Kang, Shankar Swaminathan, Adrien LaVoie | 2018-06-26 |
| 9875891 | Selective inhibition in atomic layer deposition of silicon-containing films | Dennis M. Hausmann, Bart J. van Schravendijk, Shane Tang, Karl Leeser | 2018-01-23 |
| 9824884 | Method for depositing metals free ald silicon nitride films using halide-based precursors | James S. Sims, Ramesh Chandrasekharan, Andrew John McKerrow, Seshasayee Varadarajan, Kathryn M. Kelchner | 2017-11-21 |
| 9786570 | Methods for depositing films on sensitive substrates | Hu Kang, Shankar Swaminathan, Adrien LaVoie | 2017-10-10 |
| 9670579 | Method for depositing a chlorine-free conformal SiN film | Dennis M. Hausmann, Bart van Schravendijk, Easwar Srinivasan | 2017-06-06 |
| 9601693 | Method for encapsulating a chalcogenide material | Dennis M. Hausmann, Seshasayee Varadarajan, Bhadri N. Varadarajan | 2017-03-21 |
| 9589790 | Method of depositing ammonia free and chlorine free conformal silicon nitride film | Dennis M. Hausmann, Shane Tang, James S. Sims | 2017-03-07 |
| 9570274 | Plasma activated conformal dielectric film deposition | Shankar Swaminathan, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan +3 more | 2017-02-14 |
| 9564312 | Selective inhibition in atomic layer deposition of silicon-containing films | Dennis M. Hausmann, Bart J. van Schravendijk, Shane Tang, Karl Leeser | 2017-02-07 |
| 9502238 | Deposition of conformal films by atomic layer deposition and atomic layer etch | Michal Danek, Shane Tang | 2016-11-22 |
| 9385318 | Method to integrate a halide-containing ALD film on sensitive materials | — | 2016-07-05 |
| 9287113 | Methods for depositing films on sensitive substrates | Hu Kang, Shankar Swaminathan, Adrien LaVoie | 2016-03-15 |