| 12230495 |
Method of depositing silicon nitride films |
James S. Sims, Vikrant Rai, Andrew John McKerrow, Huatan Qiu |
2025-02-18 |
| 11832533 |
Conformal damage-free encapsulation of chalcogenide materials |
James S. Sims, Andrew John McKerrow, Meihua Shen, Thorsten Lill, Kathryn M. Kelchner +4 more |
2023-11-28 |
| 11239420 |
Conformal damage-free encapsulation of chalcogenide materials |
James S. Sims, Andrew John McKerrow, Meihua Shen, Thorsten Lill, Kathryn M. Kelchner +4 more |
2022-02-01 |
| 10804099 |
Selective inhibition in atomic layer deposition of silicon-containing films |
Jon Henri, Dennis M. Hausmann, Bart J. van Schravendijk, Karl Leeser |
2020-10-13 |
| 9875891 |
Selective inhibition in atomic layer deposition of silicon-containing films |
Jon Henri, Dennis M. Hausmann, Bart J. van Schravendijk, Karl Leeser |
2018-01-23 |
| 9589790 |
Method of depositing ammonia free and chlorine free conformal silicon nitride film |
Jon Henri, Dennis M. Hausmann, James S. Sims |
2017-03-07 |
| 9564312 |
Selective inhibition in atomic layer deposition of silicon-containing films |
Jon Henri, Dennis M. Hausmann, Bart J. van Schravendijk, Karl Leeser |
2017-02-07 |
| 9502238 |
Deposition of conformal films by atomic layer deposition and atomic layer etch |
Michal Danek, Jon Henri |
2016-11-22 |
| 9076646 |
Plasma enhanced atomic layer deposition with pulsed plasma exposure |
James S. Sims, Jon Henri, Kathryn M. Kelchner, Sathish Babu S. V. Janjam |
2015-07-07 |
