Issued Patents All Time
Showing 1–25 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12354871 | Ultrathin atomic layer deposition film accuracy thickness control | Jun Qian, Adrien LaVoie, Seiji Matsuyama, Purushottam Kumar | 2025-07-08 |
| 12261038 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Shankar Swaminathan, Jun Qian, Wanki Kim, Dennis M. Hausmann, Bart J. van Schravendijk +1 more | 2025-03-25 |
| 11970772 | Dynamic precursor dosing for atomic layer deposition | Purushottam Kumar, Adrien LaVoie, Jun Qian, Ishtak Karim, Fung Suong Ou | 2024-04-30 |
| 11670503 | Method of atomic layer deposition | Jun Qian, Adrien LaVoie, Seiji Matsuyama, Purushottam Kumar | 2023-06-06 |
| 11646198 | Ultrathin atomic layer deposition film accuracy thickness control | Jun Qian, Adrien LaVoie, Seiji Matsuyama, Purushottam Kumar | 2023-05-09 |
| 11479856 | Multi-cycle ALD process for film uniformity and thickness profile modulation | Purushottam Kumar, Adrien LaVoie, Jun Qian, Tuan Nguyen, Ye Wang | 2022-10-25 |
| 11434567 | Substrate processing system with tandem source activation for CVD | Adrien LaVoie, Karl Leeser | 2022-09-06 |
| 11180850 | Dynamic precursor dosing for atomic layer deposition | Purushottam Kumar, Adrien LaVoie, Jun Qian, Ishtak Karim, Fung Suong Ou | 2021-11-23 |
| 11133180 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Shankar Swaminathan, Jun Qian, Wanki Kim, Dennis M. Hausmann, Bart J. van Schravendijk +1 more | 2021-09-28 |
| 11127567 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni, Frank L. Pasquale +8 more | 2021-09-21 |
| 11101129 | Ultrathin atomic layer deposition film accuracy thickness control | Jun Qian, Adrien LaVoie, Seiji Matsuyama, Purushottam Kumar | 2021-08-24 |
| 10741458 | Methods for depositing films on sensitive substrates | Shankar Swaminathan, Adrien LaVoie, Jon Henri | 2020-08-11 |
| 10741365 | Low volume showerhead with porous baffle | Ramesh Chandrasekharan, Saangrut Sangplung, Shankar Swaminathan, Frank L. Pasquale, Adrien LaVoie | 2020-08-11 |
| 10665429 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni, Frank L. Pasquale +8 more | 2020-05-26 |
| 10577691 | Single ALD cycle thickness control in multi-station substrate deposition systems | Romuald Nowak, Adrien LaVoie, Jun Qian | 2020-03-03 |
| 10577688 | Tandem source activation for CVD of films | Adrien LaVoie, Karl Leeser | 2020-03-03 |
| 10566187 | Ultrathin atomic layer deposition film accuracy thickness control | Jun Qian, Adrien LaVoie, Seiji Matsuyama, Purushottam Kumar | 2020-02-18 |
| 10526701 | Multi-cycle ALD process for film uniformity and thickness profile modulation | Purushottam Kumar, Adrien LaVoie, Jun Qian, Tuan Nguyen, Ye Wang | 2020-01-07 |
| 10526700 | Hardware and process for film uniformity improvement | Purushottam Kumar, Adrien LaVoie, Yi Chung Chiu, Frank L. Pasquale, Jun Qian +5 more | 2020-01-07 |
| 10407773 | Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system | Adrien LaVoie, Purushottam Kumar, Shankar Swaminathan, Jun Qian, Frank L. Pasquale +1 more | 2019-09-10 |
| 10378107 | Low volume showerhead with faceplate holes for improved flow uniformity | Ramesh Chandrasekharan, Saangrut Sangplung, Shankar Swaminathan, Frank L. Pasquale, Adrien LaVoie +6 more | 2019-08-13 |
| 10361076 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Shankar Swaminathan, Jun Qian, Wanki Kim, Dennis M. Hausmann, Bart J. van Schravendijk +1 more | 2019-07-23 |
| 10100407 | Hardware and process for film uniformity improvement | Purushottam Kumar, Adrien LaVoie, Yi Chung Chiu, Frank L. Pasquale, Jun Qian +5 more | 2018-10-16 |
| 10094018 | Dynamic precursor dosing for atomic layer deposition | Purushottam Kumar, Adrien LaVoie, Jun Qian, Ishtak Karim, Fung Suong Ou | 2018-10-09 |
| 10008428 | Methods for depositing films on sensitive substrates | Shankar Swaminathan, Adrien LaVoie, Jon Henri | 2018-06-26 |