Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12354871 | Ultrathin atomic layer deposition film accuracy thickness control | Jun Qian, Hu Kang, Adrien LaVoie, Purushottam Kumar | 2025-07-08 |
| 11670503 | Method of atomic layer deposition | Jun Qian, Hu Kang, Adrien LaVoie, Purushottam Kumar | 2023-06-06 |
| 11646198 | Ultrathin atomic layer deposition film accuracy thickness control | Jun Qian, Hu Kang, Adrien LaVoie, Purushottam Kumar | 2023-05-09 |
| 11101129 | Ultrathin atomic layer deposition film accuracy thickness control | Jun Qian, Hu Kang, Adrien LaVoie, Purushottam Kumar | 2021-08-24 |
| 10566187 | Ultrathin atomic layer deposition film accuracy thickness control | Jun Qian, Hu Kang, Adrien LaVoie, Purushottam Kumar | 2020-02-18 |
| 8288833 | Semiconductor device and manufacturing method thereof | — | 2012-10-16 |
| 8183165 | Plasma processing method | Toshio Nakanishi, Shigenori Ozaki, Hikaru Adachi, Koichi Takatsuki, Yoshihiro Sato | 2012-05-22 |
| 8021987 | Method of modifying insulating film | Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Toshio Nakanishi +4 more | 2011-09-20 |
| 7897518 | Plasma processing method and computer storage medium | Toshio Nakanishi, Shigenori Ozaki, Hikaru Adachi, Koichi Takatsuki, Yoshihiro Sato | 2011-03-01 |
| 7883746 | Insulating film formation method which exhibits improved thickness uniformity and improved composition uniformity | Jun Suzuki, Kenji Yoneda | 2011-02-08 |
| 7759598 | Substrate treating method and production method for semiconductor device | Takuya Sugawara, Masaru Sasaki | 2010-07-20 |
| 7723241 | Plasma processing method and computer storage medium | Toshio Nakanishi, Shigenori Ozaki, Hikaru Adachi, Koichi Takatsuki, Yoshihiro Sato | 2010-05-25 |
| 7662236 | Method for forming insulation film | Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Toshio Nakanishi +1 more | 2010-02-16 |
| 7655574 | Method of modifying insulating film | Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Toshio Nakanishi +4 more | 2010-02-02 |
| 7622402 | Method for forming underlying insulation film | Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Toshio Nakanishi +4 more | 2009-11-24 |
| 7517751 | Substrate treating method | Takuya Sugawara, Masaru Sasaki | 2009-04-14 |
| 7446052 | Method for forming insulation film | Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Toshio Nakanishi +1 more | 2008-11-04 |
| 7429539 | Nitriding method of gate oxide film | Takuya Sugawara, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasaki | 2008-09-30 |
| 7250375 | Substrate processing method and material for electronic device | Toshio Nakanishi, Takuya Sugawara, Masaru Sasaki | 2007-07-31 |
| 7232772 | Substrate processing method | Takuya Sugawara, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasaki | 2007-06-19 |
| 7226848 | Substrate treating method and production method for semiconductor device | Takuya Sugawara, Masaru Sasaki | 2007-06-05 |
| 7226874 | Substrate processing method | Takuya Sugawara, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasaki | 2007-06-05 |
| 7217659 | Process for producing materials for electronic device | Takuya Sugawara, Toshio Nakanishi, Shigenori Ozaki, Shigemi Murakawa, Yoshihide Tada | 2007-05-15 |
| 6897149 | Method of producing electronic device material | Takuya Sugawara, Toshio Nakanishi, Shigenori Ozaki, Shigemi Murakawa, Yoshihide Tada | 2005-05-24 |