Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9422620 | Translucent hard thin film | Hikaru Aoshima, Yousong Jiang, Ichiro Shiono | 2016-08-23 |
| 9365920 | Method for depositing film | Ichiro Shiono, Ekishu Nagae, Yousong Jiang | 2016-06-14 |
| 9315415 | Method for depositing film and oil-repellent substrate | Ichiro Shiono, Ekishu Nagae, Yousong Jiang | 2016-04-19 |
| 9157146 | Method for depositing silicon carbide film | Hikaru Aoshima, Yousong Jiang, Ichiro Shiono, Ekishu Nagae | 2015-10-13 |
| 8735304 | Film forming method, film forming apparatus, and storage medium | Yuichiro Morozumi, Koji Akiyama, Shingo Hishiya, Toshiyuki Hirota, Takakazu Kiyomura | 2014-05-27 |
| 8409961 | Alteration method and alteration apparatus for titanium nitride | Yoshihiro Sato | 2013-04-02 |
| 8336487 | Film forming apparatus | Yoshihiro Ishida, Katsushige Harada | 2012-12-25 |
| 8021987 | Method of modifying insulating film | Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasaki +4 more | 2011-09-20 |
| 7968472 | Film forming method and film forming apparatus | Yoshihiro Ishida, Katsushige Harada | 2011-06-28 |
| 7955922 | Manufacturing method of fin-type field effect transistor | Hajime NAKABAYASHI, Takashi Kobayashi, Junichi Kitagawa, Yoshitsugu Tanaka | 2011-06-07 |
| 7759598 | Substrate treating method and production method for semiconductor device | Seiji Matsuyama, Masaru Sasaki | 2010-07-20 |
| 7662236 | Method for forming insulation film | Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasaki +1 more | 2010-02-16 |
| 7655574 | Method of modifying insulating film | Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasaki +4 more | 2010-02-02 |
| 7622402 | Method for forming underlying insulation film | Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasaki +4 more | 2009-11-24 |
| 7560396 | Material for electronic device and process for producing the same | Shigenori Ozaki, Masaru Sasaki | 2009-07-14 |
| 7517812 | Method and system for forming a nitrided germanium-containing layer using plasma processing | Paul McIntyre | 2009-04-14 |
| 7517751 | Substrate treating method | Seiji Matsuyama, Masaru Sasaki | 2009-04-14 |
| 7517818 | Method for forming a nitrided germanium-containing layer using plasma processing | Paul McIntyre | 2009-04-14 |
| 7446052 | Method for forming insulation film | Yoshihide Tada, Genji Nakamura, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasakii +1 more | 2008-11-04 |
| 7429539 | Nitriding method of gate oxide film | Seiji Matsuyama, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasaki | 2008-09-30 |
| 7250375 | Substrate processing method and material for electronic device | Toshio Nakanishi, Seiji Matsuyama, Masaru Sasaki | 2007-07-31 |
| 7232772 | Substrate processing method | Seiji Matsuyama, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasaki | 2007-06-19 |
| 7226874 | Substrate processing method | Seiji Matsuyama, Shigenori Ozaki, Toshio Nakanishi, Masaru Sasaki | 2007-06-05 |
| 7226848 | Substrate treating method and production method for semiconductor device | Seiji Matsuyama, Masaru Sasaki | 2007-06-05 |
| 7217659 | Process for producing materials for electronic device | Toshio Nakanishi, Shigenori Ozaki, Seiji Matsuyama, Shigemi Murakawa, Yoshihide Tada | 2007-05-15 |