Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10996346 | α-ray measuring device | Yoshinori Sawada | 2021-05-04 |
| 10577687 | Ag alloy sputtering target and Ag alloy film manufacturing method | Yuto Toshimori, Shozo Komiyama | 2020-03-03 |
| 10415135 | Thin film formation method and thin film formation apparatus | Yohei Hinata, Kyokuyo Sai, Yoshiyuki Otaki, Yousong Jiang | 2019-09-17 |
| 9499897 | Thin film forming apparatus | Yousong Jiang, Mitsuhiro Miyauchi, Takaaki Aoyama, Tatsuya Hayashi, Ekishu Nagae | 2016-11-22 |
| 9422620 | Translucent hard thin film | Takuya Sugawara, Hikaru Aoshima, Yousong Jiang | 2016-08-23 |
| 9365920 | Method for depositing film | Ekishu Nagae, Yousong Jiang, Takuya Sugawara | 2016-06-14 |
| 9315415 | Method for depositing film and oil-repellent substrate | Ekishu Nagae, Yousong Jiang, Takuya Sugawara | 2016-04-19 |
| 9157146 | Method for depositing silicon carbide film | Takuya Sugawara, Hikaru Aoshima, Yousong Jiang, Ekishu Nagae | 2015-10-13 |
| 8826856 | Optical thin-film vapor deposition apparatus and optical thin-film production method | Ekishu Nagae, Yousong Jiang, Tadayuki Shimizu, Tatsuya Hayashi, Makoto Furukawa +1 more | 2014-09-09 |
| 7405142 | Semiconductor substrate and field-effect transistor, and manufacturing method for same | Masaharu Ninomiya, Hazumu Kougami | 2008-07-29 |
| 7198997 | Method for producing semiconductor substrate, method for producing field effect transistor, semiconductor substrate, and field effect transistor | Masaharu Ninomiya, Hazumu Kougami | 2007-04-03 |
| 7138650 | Semiconductor substrate, field-effect transistor, and their manufacturing method of the same | Kazuki Mizushima, Kenji Yamaguchi | 2006-11-21 |
| 7056789 | Production method for semiconductor substrate and production method for field effect transistor and semiconductor substrate and field effect transistor | Kazuki Mizushima, Kenji Yamaguchi | 2006-06-06 |
| 6525338 | Semiconductor substrate, field effect transistor, method of forming SiGe layer and method of forming strained Si layer using same, and method of manufacturing field effect transistor | Kazuki Mizushima, Kenji Yamaguchi | 2003-02-25 |