Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8110486 | Method of manufacturing semiconductor wafer by forming a strain relaxation SiGe layer on an insulating layer of SOI wafer | Koji Matsumoto, Tomoyuki Hora, Akihiko Endo, Etsurou Morita | 2012-02-07 |
| 7977221 | Method for producing strained Si-SOI substrate and strained Si-SOI substrate produced by the same | Koji Matsumoto, Masahiko Nakamae, Masanobu Miyao | 2011-07-12 |
| 7767548 | Method for manufacturing semiconductor wafer including a strained silicon layer | Koji Matsumoto, Masahiko Nakamae, Masanobu Miyao, Taizoh Sadoh | 2010-08-03 |
| 7405142 | Semiconductor substrate and field-effect transistor, and manufacturing method for same | Ichiro Shiono, Hazumu Kougami | 2008-07-29 |
| 7198997 | Method for producing semiconductor substrate, method for producing field effect transistor, semiconductor substrate, and field effect transistor | Ichiro Shiono, Hazumu Kougami | 2007-04-03 |
| 6277193 | Method for manufacturing semiconductor silicon epitaxial wafer and semiconductor device | Shinsuke Sadamitsu, Tooru Nagashima, Yasuo Koike, Takeshi Kii | 2001-08-21 |
| 6261362 | Silicon epitaxial wafer manufacturing method | Takashi Fujikawa | 2001-07-17 |