SO

Shigenori Ozaki

TL Tokyo Electron Limited: 25 patents #181 of 5,567Top 4%
SC Sinfonia Technology Co.: 2 patents #41 of 162Top 30%
AR Asahi Rubber: 1 patents #20 of 63Top 35%
KA Kajima: 1 patents #125 of 383Top 35%
TU Tohoku University: 1 patents #615 of 1,680Top 40%
Overall (All Time): #128,116 of 4,157,543Top 4%
29
Patents All Time

Issued Patents All Time

Showing 1–25 of 29 patents

Patent #TitleCo-InventorsDate
12315700 Plasma processing apparatus and ceiling wall Satoshi Itoh, Masashi Imanaka, Eiki KAMATA, Taro Ikeda, Soudai EMORI 2025-05-27
11118265 Film deposition method and computer program storage medium Hitoshi Kato, Takeshi Kumagai 2021-09-14
10704073 Method for determining undifferentiated state of pluripotent stem cells by culture medium analysis Kunitada HATABAYASHI, Kentaro Tomita, Shinichi GOMI, Tomoaki KURAKAZU, Yasuhiro Oshima +1 more 2020-07-07
10636680 Robot transport device Takashi Shigeta, Toshihiro Kawai, Haruki Takeuchi, Yoshimasa Suda, Hisashi Gomi 2020-04-28
10563159 Cell-holding container and cell culture method using same Yuya UBUKATA, Tsutomu Takano, Kenichi Kagawa, Yusuke YODA, Tomoaki KURAKAZU 2020-02-18
10370632 Facility for culturing pluripotent stem cells Toshimitsu Fuji, Yoshio Kinoshita, Hajime Fujinaga, Ryoji Shiina, Atsushi Nishida 2019-08-06
10351811 Cell culture container Tomoaki KURAKAZU, Yasuhiro Oshima, Yoshio Kimura, Kenichi Kagawa, Shinichi GOMI 2019-07-16
9991097 Plasma processing apparatus Tomohito Komatsu, Yutaka Fujino, Jun NAKAGOMI 2018-06-05
9932674 Film deposition apparatus, film deposition method, and computer-readable recording medium Hitoshi Kato, Katsuyuki Hishiya, Hiroyuki Kikuchi, Shigehiro Ushikubo 2018-04-03
8961735 Plasma processing apparatus and microwave introduction device Yutaka Fujino, Atsushi Ueda, Junichi Kitagawa 2015-02-24
8642487 Film deposition method and film deposition apparatus Hitoshi Kato, Shigehiro Ushikubo, Tatsuya Tamura, Takeshi Kumagai, Hiroyuki Kikuchi 2014-02-04
8183165 Plasma processing method Seiji Matsuyama, Toshio Nakanishi, Hikaru Adachi, Koichi Takatsuki, Yoshihiro Sato 2012-05-22
8067809 Semiconductor storage device including a gate insulating film with a favorable nitrogen concentration profile and method for manufacturing the same Junichi Kitagawa, Akinobu Teramoto, Tadahiro Ohmi 2011-11-29
8021987 Method of modifying insulating film Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Toshio Nakanishi, Masaru Sasaki +4 more 2011-09-20
7897518 Plasma processing method and computer storage medium Seiji Matsuyama, Toshio Nakanishi, Hikaru Adachi, Koichi Takatsuki, Yoshihiro Sato 2011-03-01
7887637 Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning Hideyuki Noguchi, Yoshiro Kabe, Kazuhiro Isa, Masaru Sasaki 2011-02-15
7723241 Plasma processing method and computer storage medium Seiji Matsuyama, Toshio Nakanishi, Hikaru Adachi, Koichi Takatsuki, Yoshihiro Sato 2010-05-25
7713864 Method of cleaning semiconductor substrate conductive layer surface Masaru Sasaki, Shinji Ide 2010-05-11
7662236 Method for forming insulation film Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Toshio Nakanishi, Masaru Sasaki +1 more 2010-02-16
7655574 Method of modifying insulating film Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Toshio Nakanishi, Masaru Sasaki +4 more 2010-02-02
7632758 Process and apparatus for forming oxide film, and electronic device material Junichi Kitagawa, Shinji Ide 2009-12-15
7622402 Method for forming underlying insulation film Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Toshio Nakanishi, Masaru Sasaki +4 more 2009-11-24
7560396 Material for electronic device and process for producing the same Takuya Sugawara, Masaru Sasaki 2009-07-14
7446052 Method for forming insulation film Takuya Sugawara, Yoshihide Tada, Genji Nakamura, Toshio Nakanishi, Masaru Sasakii +1 more 2008-11-04
7429539 Nitriding method of gate oxide film Seiji Matsuyama, Takuya Sugawara, Toshio Nakanishi, Masaru Sasaki 2008-09-30