Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12255600 | Methods of manufacturing acoustic wave device with anti-reflection layer | Satoru Matsuda, Tatsuya Fujii, Kenji Nagano | 2025-03-18 |
| 11855603 | Methods of manufacturing acoustic wave device with anti-reflection layer | Satoru Matsuda, Tatsuya Fujii, Kenji Nagano | 2023-12-26 |
| 11522515 | Acoustic wave device including interdigital electrodes covered by silicon oxynitride film | Satoru Matsuda, Atsushi Nishimura | 2022-12-06 |
| 11394364 | Acoustic wave device with anti-reflection layer | Satoru Matsuda, Tatsuya Fujii, Kenji Nagano | 2022-07-19 |
| 10882094 | Spinning forming method | Yoshihide Imamura, Yuto Sakane, Kohei MIKAMI, Hayato Iwasaki, Hiroshi Kitano | 2021-01-05 |
| 10632522 | Method of manufacturing preliminary formed body and axisymmetrical component | Yoshihide Imamura, Yuto Sakane, Kohei MIKAMI, Hayato Iwasaki, Hiroshi Kitano | 2020-04-28 |
| 10413999 | Methods of manufacturing axisymmetric body and axisymmetric product | Toshiro Tsuji, Yoshihide Imamura, Hayato Iwasaki, Hiroshi Kitano | 2019-09-17 |
| 10259030 | Spinning forming device | Kohei MIKAMI, Yoshihide Imamura, Yuto Sakane, Hayato Iwasaki, Hiroshi Kitano | 2019-04-16 |
| 10259029 | Spinning forming device | Yuto Sakane, Yoshihide Imamura, Kohei MIKAMI, Hayato Iwasaki, Hiroshi Kitano | 2019-04-16 |
| 8389420 | Method and apparatus for forming silicon oxide film | Hideo Nakamura, Junichi Kitagawa | 2013-03-05 |
| 8372761 | Plasma oxidation processing method, plasma processing apparatus and storage medium | Takashi Kobayashi, Toshihiko Shiozawa, Junichi Kitagawa | 2013-02-12 |
| 8318267 | Method and apparatus for forming silicon oxide film | Junichi Kitagawa, Sunao Muraoka | 2012-11-27 |
| 8119530 | Pattern forming method and semiconductor device manufacturing method | Masaru Hori, Toshihiko Shiozawa, Junichi Kitagawa | 2012-02-21 |
| 8105958 | Semiconductor device manufacturing method and plasma oxidation treatment method | Masaru Sasaki | 2012-01-31 |
| 8043979 | Plasma oxidizing method, storage medium, and plasma processing apparatus | Takashi Kobayashi, Junichi Kitagawa, Toshihiko Shiozawa | 2011-10-25 |
| 8034179 | Method for insulating film formation, storage medium from which information is readable with computer, and processing system | Junichi Kitagawa, Kikuo Yamabe | 2011-10-11 |
| 8026187 | Method of forming silicon oxide film and method of production of semiconductor memory device using this method | Junichi Kitagawa, Kikuo Yamabe | 2011-09-27 |
| 8003484 | Method for forming silicon oxide film, plasma processing apparatus and storage medium | Takashi Kobayashi, Toshihiko Shiozawa, Junichi Kitagawa | 2011-08-23 |
| 7989364 | Plasma oxidation processing method | Masaru Hori, Toshihiko Shiozawa, Junichi Kitagawa | 2011-08-02 |
| 7981785 | Method for manufacturing semiconductor device and plasma oxidation method | Masaru Sasaki | 2011-07-19 |
| 7910495 | Plasma oxidizing method, plasma processing apparatus, and storage medium | Toshihiko Shiozawa, Takashi Kobayashi, Hikaru Adachi, Junichi Kitagawa, Nobuhiko Yamamoto | 2011-03-22 |
| 7887637 | Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning | Shigenori Ozaki, Hideyuki Noguchi, Kazuhiro Isa, Masaru Sasaki | 2011-02-15 |
| 7524774 | Manufacturing method of semiconductor device, semiconductor manufacturing apparatus, plasma nitridation method, computer recording medium, and program | Masaru Sasaki | 2009-04-28 |