Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10133265 | Method and apparatus for autonomous identification of particle contamination due to isolated process events and systematic trends | Aaron Archer Waterman, Tetsushi Ozaki, Sanjeev Kaushal, Sukesh Janubhai Patel | 2018-11-20 |
| 9472394 | Method of forming silicon oxide film | Hiroki Murakami, Toshiyuki Ikeuchi, Jun Sato | 2016-10-18 |
| 9405289 | Method and apparatus for autonomous identification of particle contamination due to isolated process events and systematic trends | Aaron Archer Waterman, Tetsushi Ozaki, Sanjeev Kaushal, Sukesh Janubhai Patel | 2016-08-02 |
| 9390912 | Film forming method | Hiroki Murakami, Koji Sasaki, Keisuke Suzuki | 2016-07-12 |
| 9293543 | Film forming method and film forming apparatus | Shuji AZUMO, Yusaku Kashiwagi, Yu Wamura, Katsushige Harada, Kosuke Takahashi +3 more | 2016-03-22 |
| 9230799 | Method for fabricating semiconductor device and the semiconductor device | Akinobu Teramoto, Hiroshi Kambayashi, Hirokazu Ueda, Katsushige Harada, Kazuhide Hasebe +1 more | 2016-01-05 |
| 9103029 | Processing apparatus and film forming method | Yu Wamura, Izumi Sato, Shinji Asari | 2015-08-11 |
| 9034718 | Film forming method for forming boron-added silicon nitride film | Keisuke Suzuki, Kentaro Kadonaga | 2015-05-19 |
| 8815112 | Liquid processing method, recording medium having recorded program for executing liquid processing method therein and liquid processing apparatus | Tsuyoshi Mizuno, Hiromitsu Namba, Shingo Hishiya, Katsushige Harada, Fumiaki Hayase | 2014-08-26 |
| 8735304 | Film forming method, film forming apparatus, and storage medium | Takuya Sugawara, Koji Akiyama, Shingo Hishiya, Toshiyuki Hirota, Takakazu Kiyomura | 2014-05-27 |
| 8642127 | Method of forming titanium nitride film | Shingo Hishiya, Katsushige Harada | 2014-02-04 |
| 8389421 | Film formation method and film formation apparatus | Katsushige Harada, Shingo Hishiya | 2013-03-05 |
| 8288241 | Semiconductor device, method of manufacturing the same and adsorption site blocking atomic layer deposition method | Toshiyuki Hirota, Takakazu Kiyomura, Shingo Hishiya | 2012-10-16 |
| 8277891 | Method for suppressing particle generation during semiconductor manufacturing | Kenichi Koyanagi, Takashi Arao, Kazunori Une | 2012-10-02 |
| 7368384 | Film formation apparatus and method of using the same | Atsushi Endo, Tomonori Fujiwara, Katsushige Harada, Shigeru Nakajima, Dong-Kyun Choi +2 more | 2008-05-06 |
| 7041546 | Film forming method for depositing a plurality of high-k dielectric films | Kazuhide Hasebe, Shigeru Nakajima, Haruhiko Furuya, Dong-Kyun Choi, Takahito Umehara +3 more | 2006-05-09 |
| 6313047 | MOCVD method of tantalum oxide film | Kazuhide Hasebe, Dong-Kyun Choi, Takuya Sugawara, Seiji Inumiya, Yoshitaka Tsunashima | 2001-11-06 |