HF

Haruhiko Furuya

TL Tokyo Electron Limited: 9 patents #845 of 5,567Top 20%
Overall (All Time): #530,567 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
12347649 Plasma processing apparatus and lid member Hiroshi Kondo 2025-07-01
12205800 Plasma processing apparatus and plasma processing method Taro Ikeda 2025-01-21
12165846 Plasma processing apparatus and plasma processing method Eiki KAMATA, Taro Ikeda 2024-12-10
9136156 Substrate processing apparatus and film deposition apparatus Tadashi Enomoto, Mitsuhiro Tachibana, Kentaro Oshimo 2015-09-15
9080238 Raw material supplying device and film forming apparatus Yu Wamura 2015-07-14
8778812 Apparatus and method of forming thin film including adsorption step and reaction step Jun Ogawa, Masahiko Kaminishi, Yoshinobu Ise, Yoshitaka Enoki 2014-07-15
8586140 Film formation method for forming hafnium oxide film 2013-11-19
7368384 Film formation apparatus and method of using the same Atsushi Endo, Tomonori Fujiwara, Yuichiro Morozumi, Katsushige Harada, Shigeru Nakajima +2 more 2008-05-06
7041546 Film forming method for depositing a plurality of high-k dielectric films Yuichiro Morozumi, Kazuhide Hasebe, Shigeru Nakajima, Dong-Kyun Choi, Takahito Umehara +3 more 2006-05-09