YW

Yu Wamura

TL Tokyo Electron Limited: 15 patents #423 of 5,567Top 8%
OU Osaka University: 1 patents #681 of 1,984Top 35%
📍 Iwate, JP: #24 of 263 inventorsTop 10%
Overall (All Time): #309,353 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
12368030 Deposition method and deposition apparatus Hitoshi Kato, Yuichiro Sase, Yuji Sawada, Hiroyuki Kikuchi 2025-07-22
10793432 Output inspection method for ozone mass flow controller 2020-10-06
10472719 Nozzle and substrate processing apparatus using same Fumiaki Hayase, Masahiko Kaminishi, Kosuke Takahashi, Hiroko Sasaki, Yu Sasaki 2019-11-12
10053776 Method of detoxifying exhaust pipe and film forming apparatus Fumiaki Hayase, Masahiko Kaminishi, Kosuke Takahashi, Yu Sasaki, Hiroko Sasaki 2018-08-21
9929008 Substrate processing method and substrate processing apparatus Fumiaki Hayase, Masahiko Kaminishi, Yu Sasaki, Kosuke Takahashi 2018-03-27
9748104 Method of depositing film Hiroko Sasaki, Masato Koakutsu 2017-08-29
9435026 Film deposition apparatus Tomonori Kuwamoto 2016-09-06
9418837 Semiconductor device manufacturing method and substrate treatment system Koji Akiyama, Hirokazu Higashijima, Chihiro TAMURA, Shintaro Aoyama 2016-08-16
9293543 Film forming method and film forming apparatus Shuji AZUMO, Yusaku Kashiwagi, Yuichiro Morozumi, Katsushige Harada, Kosuke Takahashi +3 more 2016-03-22
9165780 Plasma processing apparatus and plasma processing method Akira Shimizu 2015-10-20
9103029 Processing apparatus and film forming method Yuichiro Morozumi, Izumi Sato, Shinji Asari 2015-08-11
9080238 Raw material supplying device and film forming apparatus Haruhiko Furuya 2015-07-14
8992685 Substrate processing apparatus, substrate processing method, and computer-readable storage medium Hitoshi Kato, Manabu Honma, Hiroyuki Kikuchi, Jun Ogawa 2015-03-31
8895456 Method of depositing a film Mitsuhiro Tachibana, Hiroaki Ikegawa, Muneyuki OTANI, Jun Ogawa, Kosuke Takahashi 2014-11-25
8896097 Method of manufacturing capacitor, capacitor and method of forming dielectric film for use in capacitor Koji Akiyama, Shingo Hishiya, Katsushige Harada 2014-11-25