Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10886170 | Method of forming tungsten film | Koji Maekawa, Takashi Sameshima, Mikio Suzuki, Susumu Arima, Atsushi Matsumoto +1 more | 2021-01-05 |
| 10612139 | Method of forming a tungsten film having a low resistance | Koji Maekawa, Takashi Sameshima, Mikio Suzuki, Susumu Arima, Atsushi Matsumoto +1 more | 2020-04-07 |
| 9418837 | Semiconductor device manufacturing method and substrate treatment system | Koji Akiyama, Hirokazu Higashijima, Chihiro TAMURA, Yu Wamura | 2016-08-16 |
| 8722548 | Structures and techniques for atomic layer deposition | Robert D. Clark, Steven P. Consiglio, Marinus Hopstaken, Hemanth Jagannathan, Paul C. Jamison +4 more | 2014-05-13 |
| 7867920 | Method for modifying high-k dielectric thin film and semiconductor device | Kazuyoshi Yamazaki, Koji Akiyama | 2011-01-11 |
| 7858509 | High-dielectric film substrate processing method | Miki Aruga, Kazuyoshi Yamazaki, Kouji Shimomura | 2010-12-28 |
| 7754293 | Film forming method | Masanobu Igeta, Kazuyoshi Yamazaki | 2010-07-13 |
| 7497964 | Plasma igniting method and substrate processing method | Masanobu Igeta, Kazuyoshi Yamazaki, Hiroshi Shinriki | 2009-03-03 |
| 7378358 | Method for forming insulating film on substrate, method for manufacturing semiconductor device and substrate-processing apparatus | Masanobu Igeta, Hiroshi Shinriki | 2008-05-27 |
| 7129185 | Substrate processing method and a computer readable storage medium storing a program for controlling same | Masanobu Igeta, Hiroshi Shinriki | 2006-10-31 |
| 7125799 | Method and device for processing substrate, and apparatus for manufacturing semiconductor device | Masanobu Igeta, Hiroshi Shinriki, Tsuyoshi Takahashi | 2006-10-24 |
| 7105101 | Method of removing oxide film on a substrate with hydrogen and fluorine radicals | Hiroshi Shinriki | 2006-09-12 |
| 6949478 | Oxide film forming method | Tadahiro Ohmi, Takashi Imaoka, Hisayuki Shimada, Nobuhiro Konishi, Mizuho Morita +5 more | 2005-09-27 |
| 6927112 | Radical processing of a sub-nanometer insulation film | Masanobu Igeta, Hiroshi Shinriki, Tsuyoshi Takahashi | 2005-08-09 |
| 6866890 | Method of forming a dielectric film | Hideki Kiryu, Tsuyoshi Takahashi, Hiroshi Shinriki | 2005-03-15 |
| 6794308 | Method for reducing by-product deposition in wafer processing equipment | Ming-Jang Hwang, Keizo Hosoda, Tadashi Terasaki, Tsuyoshi Tamaru | 2004-09-21 |
| 6730613 | Method for reducing by-product deposition in wafer processing equipment | Ming-Jang Hwang, Keizo Hosoda, Tadashi Terasaki, Tsuyoshi Tamaru | 2004-05-04 |
| 6617207 | Method and system for forming a stacked gate insulating film | Hideki Kiryu | 2003-09-09 |
| 6467491 | Processing apparatus and processing method | Masahito Sugiura, Hiroshi Shinriki, Hideki Kiryu | 2002-10-22 |
| 6194292 | Method of fabricating in-situ doped rough polycrystalline silicon using a single wafer reactor | Robert Tsu, Toshio Ando | 2001-02-27 |
| 6146135 | Oxide film forming method | Jinzo Watanabe, Takeo Yamashita, Masakazu Nakamura, Hidetoshi Wakamatsu, Tadashi Shibata +5 more | 2000-11-14 |