Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12195854 | Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and recording medium | Teruo Yoshino, Takeshi Yasui, Masaki Murobayashi, Koichiro Harada, Masanori NAKAYAMA | 2025-01-14 |
| 11905596 | Method of manufacturing semiconductor device, and recording medium | Teruo Yoshino, Takeshi Yasui, Masaki Murobayashi, Koichiro Harada, Masanori NAKAYAMA | 2024-02-20 |
| 11155922 | Method of manufacturing semiconductor device, and recording medium | Teruo Yoshino, Takeshi Yasui, Masaki Murobayashi, Koichiro Harada, Masanori NAKAYAMA | 2021-10-26 |
| 10192735 | Substrate processing method and substrate processing apparatus | Tatsushi UEDA, Unryu Ogawa, Akito Hirano | 2019-01-29 |
| 9978653 | Method of manufacturing semiconductor device | Masanori NAKAYAMA | 2018-05-22 |
| 9929005 | Method of manufacturing semiconductor device | Satoshi Shimamoto, Teruo Yoshino, Masanori NAKAYAMA | 2018-03-27 |
| 9754780 | Substrate processing method and substrate processing apparatus | Tatsushi UEDA, Unryu Ogawa, Akito Hirano | 2017-09-05 |
| 9236242 | Substrate processing method and substrate processing apparatus | Tatsushi UEDA, Unryu Ogawa, Akito Hirano | 2016-01-12 |
| 9059229 | Substrate processing apparatus and method of manufacturing semiconductor device | Masanori NAKAYAMA, Mitsunori Takeshita, Katsunori FUNAKI | 2015-06-16 |
| 8334215 | Substrate processing method and substrate processing apparatus | Tatsushi UEDA, Unryu Ogawa, Akito Hirano | 2012-12-18 |
| 8178445 | Substrate processing apparatus and manufacturing method of semiconductor device using plasma generation | Tadashi Horie, Akito Hirano | 2012-05-15 |
| 8084315 | Method of fabricating non-volatile semiconductor memory device by using plasma film-forming method and plasma nitridation | Katsuhiko Yamamoto, Yoshiki Yonamoto, Hirotaka Hamamura | 2011-12-27 |
| 8071446 | Manufacturing method of semiconductor device and substrate processing apparatus | — | 2011-12-06 |
| 8066894 | Substrate processing method and substrate processing apparatus | Tatsushi UEDA, Unryu Ogawa, Akito Hirano | 2011-11-29 |
| 7795156 | Producing method of semiconductor device | Akito Hirano, Masanori NAKAYAMA, Unryu Ogawa | 2010-09-14 |
| 7045447 | Semiconductor device producing method and semiconductor device producing apparatus including forming an oxide layer and changing the impedance or potential to form an oxynitride | Unryu Ogawa, Naoya Yamakado, Shinji Yashima | 2006-05-16 |
| 6794308 | Method for reducing by-product deposition in wafer processing equipment | Ming-Jang Hwang, Keizo Hosoda, Shintaro Aoyama, Tsuyoshi Tamaru | 2004-09-21 |
| 6730613 | Method for reducing by-product deposition in wafer processing equipment | Ming-Jang Hwang, Keizo Hosoda, Shintaro Aoyama, Tsuyoshi Tamaru | 2004-05-04 |