Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12188124 | Substrate processing apparatus, gas nozzle and method of manufacturing semiconductor device | Yuji Takebayashi, Toshiki Fujino, Yukihito Hada, Naoko Tsunoda | 2025-01-07 |
| 10192735 | Substrate processing method and substrate processing apparatus | Tatsushi UEDA, Tadashi Terasaki, Akito Hirano | 2019-01-29 |
| 10163663 | Substrate processing apparatus, exhaust system and method of manufacturing semiconductor device | Toshihiko Yonejima, Masanori OKUNO, Masakazu Sakata, Hiroki OKAMIYA, Takeshi Kasai +6 more | 2018-12-25 |
| 9754780 | Substrate processing method and substrate processing apparatus | Tatsushi UEDA, Tadashi Terasaki, Akito Hirano | 2017-09-05 |
| 9236242 | Substrate processing method and substrate processing apparatus | Tatsushi UEDA, Tadashi Terasaki, Akito Hirano | 2016-01-12 |
| 8987645 | Substrate processing apparatus having rotatable slot-type antenna and method of manufacturing semiconductor device using the same | Masahisa Okuno, Tokunobu Akao, Shinji Yashima, Atsushi UMEKAWA, Kaichiro MINAMI | 2015-03-24 |
| 8557720 | Substrate processing apparatus and method of manufacturing a semiconductor device | Tokunobu Akao, Masahisa Okuno, Shinji Yashima, Atsushi UMEKAWA, Kaichiro MINAMI | 2013-10-15 |
| 8486222 | Substrate processing apparatus and method of manufacturing a semiconductor device | Tokunobu Akao, Masahisa Okuno, Shinji Yashima, Atsushi UMEKAWA, Kaichiro MINAMI | 2013-07-16 |
| 8334215 | Substrate processing method and substrate processing apparatus | Tatsushi UEDA, Tadashi Terasaki, Akito Hirano | 2012-12-18 |
| 8066894 | Substrate processing method and substrate processing apparatus | Tatsushi UEDA, Tadashi Terasaki, Akito Hirano | 2011-11-29 |
| 7795156 | Producing method of semiconductor device | Tadashi Terasaki, Akito Hirano, Masanori NAKAYAMA | 2010-09-14 |
| 7045447 | Semiconductor device producing method and semiconductor device producing apparatus including forming an oxide layer and changing the impedance or potential to form an oxynitride | Naoya Yamakado, Tadashi Terasaki, Shinji Yashima | 2006-05-16 |
| 6727654 | Plasma processing apparatus | Takayuki Sato | 2004-04-27 |
| 6376796 | Plasma processing system | Noriyoshi Sato, Satoru Iizuka, Tsukasa Yoneyama, Hiroyasu Sato, Yoshio Tominaga +2 more | 2002-04-23 |