Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11823910 | Systems and methods for improving planarity using selective atomic layer etching (ALE) | David L. O'Meara, Anthony Dip | 2023-11-21 |
| 11605712 | Fabrication process flow of dielectric layer for isolation of nano-sheet devices on bulk silicon substrate | Shimpei Yamaguchi, Atsushi Tsuboi, Atsushi Endo, Masaru Sugimoto, Hiroshi Yano +1 more | 2023-03-14 |
| 10700009 | Ruthenium metal feature fill for interconnects | Kai-Hung Yu, Nicholas Joy, Eric Chih-Fang Liu, David L. O'Meara, David S. H. Rosenthal +2 more | 2020-06-30 |
| 8853100 | Film formation method, film formation apparatus and storage medium | Jun Sato, Kazuo Yabe, Hitoshi Kato, Yusaku Izawa | 2014-10-07 |
| 7754293 | Film forming method | Shintaro Aoyama, Kazuyoshi Yamazaki | 2010-07-13 |
| 7501352 | Method and system for forming an oxynitride layer | Cory Wajda, David L. O'Meara, Kristen Scheer, Toshihara Eurakawa | 2009-03-10 |
| 7497964 | Plasma igniting method and substrate processing method | Kazuyoshi Yamazaki, Shintaro Aoyama, Hiroshi Shinriki | 2009-03-03 |
| 7378358 | Method for forming insulating film on substrate, method for manufacturing semiconductor device and substrate-processing apparatus | Shintaro Aoyama, Hiroshi Shinriki | 2008-05-27 |
| 7129185 | Substrate processing method and a computer readable storage medium storing a program for controlling same | Shintaro Aoyama, Hiroshi Shinriki | 2006-10-31 |
| 7125799 | Method and device for processing substrate, and apparatus for manufacturing semiconductor device | Shintaro Aoyama, Hiroshi Shinriki, Tsuyoshi Takahashi | 2006-10-24 |
| 6927112 | Radical processing of a sub-nanometer insulation film | Shintaro Aoyama, Hiroshi Shinriki, Tsuyoshi Takahashi | 2005-08-09 |