| 12482667 |
Thermal etching of ruthenium |
Hisashi Higuchi, Kai Yu, Gyanaranjan Pattanaik, Kandabara Tapily, Gerrit J. Leusink +1 more |
2025-11-25 |
|
| 12237216 |
Method for filling recessed features in semiconductor devices with a low-resistivity metal |
Kai-Hung Yu, Shihsheng Chang, Ying Trickett, Eric Chih-Fang Liu, Yun Han +5 more |
2025-02-25 |
|
| 11700778 |
Method for controlling the forming voltage in resistive random access memory devices |
Steven P. Consiglio, Kandabara Tapily, Takaaki Tsunomura, Takashi Ando, Paul C. Jamison +3 more |
2023-07-11 |
|
| 11621190 |
Method for filling recessed features in semiconductor devices with a low-resistivity metal |
Kai-Hung Yu, David L. O'Meara, Nicholas Joy, Gyanaranjan Pattanaik, Robert D. Clark +3 more |
2023-04-04 |
|
| 11024535 |
Method for filling recessed features in semiconductor devices with a low-resistivity metal |
Kai-Hung Yu, David L. O'Meara, Nicholas Joy, Gyanaranjan Pattanaik, Robert D. Clark +3 more |
2021-06-01 |
|
| 10991881 |
Method for controlling the forming voltage in resistive random access memory devices |
Steven P. Consiglio, Kandabara Tapily, Takaaki Tsunomura, Takashi Ando, Paul C. Jamison +3 more |
2021-04-27 |
|
| 10950460 |
Method utilizing using post etch pattern encapsulation |
Angelique Raley, Andrew Metz, Junling Sun |
2021-03-16 |
|
| 10700009 |
Ruthenium metal feature fill for interconnects |
Kai-Hung Yu, Nicholas Joy, Eric Chih-Fang Liu, David L. O'Meara, David S. H. Rosenthal +2 more |
2020-06-30 |
|
| 10157784 |
Integration of a self-forming barrier layer and a ruthenium metal liner in copper metallization |
Kai-Hung Yu, Manabu Oie, Kaoru Maekawa, Gerrit J. Leusink, Yuuki Kikuchi +2 more |
2018-12-18 |
|
| 10068764 |
Selective metal oxide deposition using a self-assembled monolayer surface pretreatment |
Kandabara Tapily, Gerrit J. Leusink, Hoyoung Kang |
2018-09-04 |
|
| 10056328 |
Ruthenium metal feature fill for interconnects |
Kai-Hung Yu, Gerrit J. Leusink, Tadahiro Ishizaka, Takahiro Hakamata |
2018-08-21 |
|
| 10008564 |
Method of corner rounding and trimming of nanowires by microwave plasma |
Kandabara Tapily, Ying Trickett, Chihiro TAMURA, Gerrit J. Leusink, Kaoru Maekawa |
2018-06-26 |
|
| 9711449 |
Ruthenium metal feature fill for interconnects |
Kai-Hung Yu, Gerrit J. Leusink, Tadahiro Ishizaka, Takahiro Hakamata |
2017-07-18 |
|
| 9607888 |
Integration of ALD barrier layer and CVD Ru liner for void-free Cu filling |
Kai-Hung Yu, Toshio Hasegawa, Tadahiro Ishizaka, Manabu Oie, Fumitaka Amano +3 more |
2017-03-28 |
|
| 8722548 |
Structures and techniques for atomic layer deposition |
Shintaro Aoyama, Robert D. Clark, Steven P. Consiglio, Marinus Hopstaken, Hemanth Jagannathan +4 more |
2014-05-13 |
$6,724,000 |
| 8460945 |
Method for monitoring status of system components |
David L. O'Meara, Daniel Craig Burdett, Stephen Cabral, Gert Leusink, John William Kostenko |
2013-06-11 |
|
| 7964515 |
Method of forming high-dielectric constant films for semiconductor devices |
Robert D. Clark |
2011-06-21 |
|
| 7517814 |
Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently |
Kristen Scheer, Toshihara Furakawa |
2009-04-14 |
$4,368,000 |
| 7501352 |
Method and system for forming an oxynitride layer |
Masanobu Igeta, David L. O'Meara, Kristen Scheer, Toshihara Eurakawa |
2009-03-10 |
$6,331,000 |
| 7479454 |
Method and processing system for monitoring status of system components |
David L. O'Meara, Daniel Craig Burdett, Stephen Cabral, Gert Leusink, John William Kostenko |
2009-01-20 |
|
| 7470591 |
Method of forming a gate stack containing a gate dielectric layer having reduced metal content |
David L. O'Meara, Youngjong Lee |
2008-12-30 |
|
| 7419702 |
Method for processing a substrate |
Kazuhito Nakamura, Enrico Mosca, Yumiko Kawano, Gert Leusink, Fenton R. McFeely +1 more |
2008-09-02 |
$13,493,000 |
| 7393761 |
Method for fabricating a semiconductor device |
Gert Leusink |
2008-07-01 |
|
| 7300891 |
Method and system for increasing tensile stress in a thin film using multi-frequency electromagnetic radiation |
Igeta Masonobu, Gert Leusink |
2007-11-27 |
|
| 7235440 |
Formation of ultra-thin oxide layers by self-limiting interfacial oxidation |
David L. O'Meara, Anthony Dip, Michael Toeller, Toshihara Furukawa, Kristen Scheer +6 more |
2007-06-26 |
$10,209,000 |
