Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for processing a substrate

Method for processing a substrate

US Patent 7419702 · Granted Sep 2, 2008

Estimated economic value: $13,493,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Thermal etching of ruthenium2025
Film-forming method2025
Selective film formation using self-assembled monolayer2025
Film formation method and film formation apparatus2025
Method for filling recessed features in semiconductor devices with a low-resisti2025
Film formation method and film formation device2024
Film forming method for forming self-assembled monolayer on substrate2024
Method of manufacturing semiconductor device2024
Method for forming film2023
Film formation method and film formation device2023
Method for controlling the forming voltage in resistive random access memory dev2023
Method for filling recessed features in semiconductor devices with a low-resisti2023