CW

Cory Wajda

TL Tokyo Electron Limited: 27 patents #155 of 5,567Top 3%
IBM: 7 patents #14,640 of 70,183Top 25%
📍 Albany, NY: #56 of 790 inventorsTop 8%
🗺 New York: #4,427 of 115,490 inventorsTop 4%
Overall (All Time): #134,101 of 4,157,543Top 4%
28
Patents All Time

Issued Patents All Time

Showing 26–28 of 28 patents

Patent #TitleCo-InventorsDate
6974779 Interfacial oxidation process for high-k gate dielectric process integration David L. O'Meara, Tsuyoshi Takahashi, Alessandro C. Callegari, Kristen Scheer, Sufi Zafar +1 more 2005-12-13
6500761 Method for improving the adhesion and durability of CVD tantalum and tantalum nitride modulated films by plasma treatment Joseph T. Hillman 2002-12-31
6455414 Method for improving the adhesion of sputtered copper films to CVD transition metal based underlayers Joseph T. Hillman, Steven P. Caliendo 2002-09-24