Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261205 | Semiconductor device | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2025-03-25 |
| 12080716 | Method of manufacturing semiconductor device | Yoshiki Yamamoto, Masaaki Shinohara, Toshiaki Iwamatsu, Hidekazu Oda | 2024-09-03 |
| 11996448 | Manufacturing method of semiconductor device including field-effect transistor comprising buried oxide (BOX) film and silicon layer | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2024-05-28 |
| 11700778 | Method for controlling the forming voltage in resistive random access memory devices | Steven P. Consiglio, Cory Wajda, Kandabara Tapily, Takashi Ando, Paul C. Jamison +3 more | 2023-07-11 |
| 11695012 | Semiconductor device and manufacturing method of the same | Yoshiki Yamamoto, Masaaki Shinohara, Toshiaki Iwamatsu, Hidekazu Oda | 2023-07-04 |
| 11658211 | Semiconductor device and manufacturing method of the same | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2023-05-23 |
| 10991881 | Method for controlling the forming voltage in resistive random access memory devices | Steven P. Consiglio, Cory Wajda, Kandabara Tapily, Takashi Ando, Paul C. Jamison +3 more | 2021-04-27 |
| 10756115 | Semiconductor device and manufacturing method of the same | Yoshiki Yamamoto, Masaaki Shinohara, Toshiaki Iwamatsu, Hidekazu Oda | 2020-08-25 |
| 10510775 | Semiconductor device and manufacturing method of the same | Yoshiki Yamamoto, Masaaki Shinohara, Toshiaki Iwamatsu, Hidekazu Oda | 2019-12-17 |
| 10461158 | Semiconductor device and manufacturing method of the same | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2019-10-29 |
| 10410858 | Selective film deposition using halogen deactivation | Kandabara Tapily | 2019-09-10 |
| 10411112 | Semiconductor device with silicon layer containing carbon | Toshiaki Iwamatsu | 2019-09-10 |
| 10263078 | Method of manufacturing a MISFET on an SOI substrate | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2019-04-16 |
| 9978839 | Method of manufacturing a MOSFET on an SOI substrate | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2018-05-22 |
| 9935125 | Semiconductor device and manufacturing method of the same | Yoshiki Yamamoto, Masaaki Shinohara, Toshiaki Iwamatsu, Hidekazu Oda | 2018-04-03 |
| 9773872 | Method of manufacturing a semiconductor device to prevent occurrence of short-channel characteristics and parasitic capacitance | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2017-09-26 |
| 9722044 | Manufacturing method of semiconductor device with silicon layer containing carbon | Toshiaki Iwamatsu | 2017-08-01 |
| 9484433 | Method of manufacturing a MISFET on an SOI substrate | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2016-11-01 |
| 9484456 | Semiconductor device and manufacturing method of the same | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2016-11-01 |
| 9460936 | Semiconductor device and method of manufacturing the same | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2016-10-04 |
| 9293347 | Semiconductor device and method of manufacturing the same | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2016-03-22 |
| 9263346 | Semiconductor device with silicon layer containing carbon | Toshiaki Iwamatsu | 2016-02-16 |
| 9196705 | Method of manufacturing a misfet on an SOI substrate | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2015-11-24 |
| 9130039 | Semiconductor device and manufacturing method of the same | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2015-09-08 |
| 8941178 | MOS field-effect transistor formed on the SOI substrate | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2015-01-27 |