Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12400872 | Sacrificial capping layer for gate protection | David L. O'Meara, Cheryl Alix, Andrew Metz, Shan Hu, Henan Zhang | 2025-08-26 |
| 12341009 | Variable hardness amorphous carbon mask | Shihsheng Chang, Andrew Metz, Ya-Ming Chen, Kai-Hung Yu, Eric Chih-Fang Liu | 2025-06-24 |
| 12300500 | Etching of polycrystalline semiconductors | Alok Ranjan, Tomoyuki Oishi, Shuhei Ogawa, Ken Kobayashi, Peter Biolsi | 2025-05-13 |
| 12288692 | Method of forming a FET structure by selective deposition of film on source/drain contact | Alok Ranjan, Peter Ventzek, Andrew Metz, Hiroaki Niimi | 2025-04-29 |
| 12266533 | Sacrificial capping layer for contact etch | Andrew Metz, Peter Biolsi | 2025-04-01 |
| 12237216 | Method for filling recessed features in semiconductor devices with a low-resistivity metal | Kai-Hung Yu, Shihsheng Chang, Ying Trickett, Eric Chih-Fang Liu, Henan Zhang +5 more | 2025-02-25 |
| 12189297 | Methods for extreme ultraviolet (EUV) resist patterning development | Peter L. G. Ventzek, Alok Ranjan | 2025-01-07 |
| 12040176 | Technologies for high aspect ratio carbon etching with inserted charge dissipation layer | Shihsheng Chang, Andrew Metz, Minjoon Park, Ya-Ming Chen | 2024-07-16 |
| 11961735 | Cyclic plasma processing | Caitlin Philippi, Andrew Metz, Alok Ranjan | 2024-04-16 |
| 11942307 | Plasma processing with radio frequency (RF) source and bias signal waveforms | Zhiying Chen, Barton Lane, Peter Ventzek, Alok Ranjan | 2024-03-26 |
| 11651967 | Non-atomic layer deposition (ALD) method of forming sidewall passivation layer during high aspect ratio carbon layer etch | Shihsheng Chang, David L. O'Meara, Andrew Metz | 2023-05-16 |
| 11605539 | Defect correction on metal resists | Peter L. G. Ventzek, Alok Ranjan | 2023-03-14 |
| 11532517 | Localized etch stop layer | Andrew Metz, Xinghua Sun, David L. O'Meara, Kandabara Tapily, Henan Zhang +1 more | 2022-12-20 |
| 11527413 | Cyclic plasma etch process | Peter L. G. Ventzek, Alok Ranjan | 2022-12-13 |
| 11342195 | Methods for anisotropic etch of silicon-based materials with selectivity to organic materials | Peter Ventzek, Alok Ranjan | 2022-05-24 |
| 11195723 | Non-atomic layer deposition (ALD) method of forming sidewall passivation layer during high aspect ratio carbon layer etch | Shihsheng Chang, David L. O'Meara, Andrew Metz | 2021-12-07 |
| 11094543 | Defect correction on metal resists | Peter Ventzek, Alok Ranjan | 2021-08-17 |
| 11079682 | Methods for extreme ultraviolet (EUV) resist patterning development | Peter L. G. Ventzek, Alok Ranjan | 2021-08-03 |